Used TEL / TOKYO ELECTRON Clean Track ACT 8 #9057502 for sale
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ID: 9057502
Wafer Size: 8"
Vintage: 2000
Single block system, 8"
(3) Blocks interface: Cassette-process-side cabinet interface
(2) Transfer robot arms: Cassette and process
(2) SOG Coaters
(2) SOG nozzles with temperature control
TARC compatible: Teflon coated chamber
(4) Chill plate process stations with temperature control
Transfer chill plate
(4) Low temperature hot plate process stations with temperature control
(4) High temperature hot plate process stations with temperature control
Sub-components:
Fluid temperature controller
Temperature and humidity controller
Side chemical cabinet
AC Power box
SECS/GEM compatible
2000 vintage.
TEL / TOKYO ELECTRON Clean Track ACT 8 is a photoresist equipment designed for precise etching, coating, and adhesion in the fabrication of semiconductor devices. It is mainly used in the areas of circuitboard assembly and wafer processing. The system uses a specialized form of a photoresist (PR) material, which is applied on the wafer surface and allows the light source to etch specific portions of the material. The PR material is applied to the surface using a vacuum coating apparatus, which evenly distributes the PR material over the surface. Once the component has been surrounded by PR material, the light source is activated, and it will selectively etch the material according to the specified design data. By adjusting the light intensity, exposure time, and the angle of the light source, the pattern required for the component can be achieved. The unit is designed for precise and accurate positioning of the PR material, which is essential for creating accurate and exact components. To achieve this machine features a high-resolution stage tool and an air bearing stage asset with a precision of 3 microns. The air bearing stage model can be used to accurately position the components prior to etching. In addition to etching, the equipment is also capable of coating both inside and outside corners of a product with a single application. This further facilitates the production of accurate and elaborate designs. To ensure uniformity, the system is equipped with alignment and uniformity inspection features which detect deviations from uniformity to enable timely adjustments. Furthermore, the unit is also capable of carrying out adhesion processes such as metal deposition, activation, an adhesive hardening. The machine applies a very strong vacuum to ensure that the application of the adhesive is consistent, and the hardening process is precise. Overall, TEL Clean Track ACT 8 is a precise and versatile photoresist tool well-suited for the fabrication of semiconductor devices. The asset the necessary features to ensure a high-quality product with little to no deviation from the target design.
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