Used TEL / TOKYO ELECTRON Clean Track ACT 8 #9078027 for sale

TEL / TOKYO ELECTRON Clean Track ACT 8 is a photoresist equipment designed to enable clean, efficient and reliable lithographic processes in semiconductor manufacturing. The system performs photoresist strip functionalities and is used to remove photoresists from the surface of the wafer after a lithographic exposure. The unit also provides inline surface contamination monitorng as well as surface cleaning of the lithographic mandrels. TEL Clean Track ACT 8 machine leverages advanced actinic technology to provide improved uniformity of surface film thickness, increased process speed and improved wafer surface cleanliness. It integrates a 450W Xe excimer laser scanner to provide high throughput deep ultraviolet (DUV) processing for wet etching processes such as deep hole etching. The tool is designed to enable lower defectivity with a high accuracy of strip efficiency and improved process stability. It features an improved chemical injector for precise control of dopants for nanostructured resist processing, as well as improved stage drive accuracy for nanoscale etch processes. Additionally, the asset comes with a high-resolution microscope for automated photoresist segmentation and enhanced defect inspection. TOKYO ELECTRON Clean Track ACT 8 model is equipped with a low thermal emission source to reduce wafer temperature excursions during deep etching processes, and an improved group electrode configuration for improved uniformity of resist etch and surface film thickness. It also has a automated clean room managing equipment and monitoring system to ensure enhanced safety, reliability and efficiency. Users of Clean Track ACT 8 unit benefit from short cycle times and enhanced stability and reliability, making it an ideal choice for efficient and accurate semiconductor manufacturing processes. It offers reduced running costs and improved throughput as compared to other solutions available on the market. Additionally, its easy-to-use software allows for automated and consistent calibration for lithography processes.