Used TEL / TOKYO ELECTRON Clean Track ACT 8 #9165438 for sale

TEL / TOKYO ELECTRON Clean Track ACT 8 is a photoresist equipment used in the fabrication of integrated circuits. The system consists of a specialized multi-chromatic laser source, an optical mask, and a layered photoresist film stack. The laser source provides a highly precise and localized radial energy flux, enabling the photoresist to be exposed through the optical mask. The photoresist stack used in the unit is composed of at least four layers. The first layer is a masking layer that serves as a physical barrier to protect underlying layers from exposure to the laser beam. The second layer is a photosensitive layer, which is composed of either photoresist or chemicals with photo-sensitive properties. This layer is specifically designed to allow etching to occur only when it is exposed to light. The third layer is a developer which helps in the process of removing the unwanted portions of the photosensitive layer. The final layer is a passivation layer, which prevents any unwanted exposure of the photographed region. The primary advantage of TEL Clean Track ACT 8 is its high resolution and repeatable imaging capability, which is due to the focused energy flux from the ultra-fine motion laser source. The laser source has a spot size of 100-400 nanometers which enables high-precision imaging and increases the accuracy of fabrication. Additionally, the photoresist layers are formulated with enhanced resolution and through control, eliminating the inherent distorted photographs observed with traditional photoresist processes. The machine's efficiency is further enhanced by its multi-layer processing feature. This allows it to perform multiple steps of the etching process consecutively with a single exposure; the photoresist layers are designed to be sufficiently thick to enable an appropriate level of photo-exposure. The multiple layers also enable the tool to simultaneously remove unwanted portions of the masking layer and photosensitive layer. The high level of integration of photoresist layers with the focused laser beam also enables light ablation, a process that enables the circuit to become structurally integrated with the underlying substrate. This process allows the substrate to be pre-polished with a high degree of control, eliminating the need for further polish after etching. Overall, TOKYO ELECTRON Clean Track ACT 8 photoresist asset provides an extremely accurate and efficient way to fabricate integrated circuits with tight tolerances, enabling high-precision circuit design and manufacture. The photoresist layers are formulated with the right balance of resolution and through control and the laser flux allows for whole-step processing with a single exposure. Additionally, light ablation makes the process more efficient and cost-effective, while at the same time providing a high level of accuracy.