Used TEL / TOKYO ELECTRON Clean Track ACT 8 #9165439 for sale

TEL / TOKYO ELECTRON Clean Track ACT 8
ID: 9165439
Wafer Size: 8"
(4) Coater / (4) Developer system, 8" Double block DUV IFB Right to left wafer flow (4) SUCs SMIF Interface for ASML PAS 5500.
TEL / TOKYO ELECTRON Clean Track ACT 8 is a high-performance photoresist equipment that enables the precise lithography of complex structures and selective etch processes. It is designed to reduce the occurrence of defects in the photoresist process, ensuring high yield and defect-free surfaces. TEL Clean Track ACT 8 utilizes a scanning electron microscope (SEM) to create an ultra-finite pattern on a wafer utilizing dithering and high-resolution imaging. The system is compatible with a variety of photoresist solutions, including standard positive and negative types, as well as new, more robust materials. The combination of enhanced photoresist resolution with precise lithography manufacturing processes results in a highly-precise product. TOKYO ELECTRON Clean Track ACT 8 also incorporates a number of specialized features designed to ensure high-quality products with excellent uniformity and minimal risk of defects. This includes a specialized heated wafer holder that evenly heats the wafer with an advanced thermal distribution unit. The machine also includes a three-stage vacuum degassing process to remove air pockets from the photoresist. In addition, Clean Track ACT 8 is equipped with automated inspection techniques that scan a wafer for defects. This feature enables users to quickly identify any potentially problematic areas, allowing for rapid corrective action. Any defect-free areas are then optically inspected to ensure required accuracy and quality. TEL / TOKYO ELECTRON Clean Track ACT 8 is a powerful photoresist tool that enables the precise lithography of complex designs with minimized defect rates. It is equipped with several features that allow users to quickly and accurately identify any potential issues, while ensuring a high degree of accuracy and uniformity. The result is a defect-free surface with excellent consistency, enabling an efficient and reliable fabrication process.
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