Used TEL / TOKYO ELECTRON Clean Track ACT 8 #9182601 for sale
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ID: 9182601
Wafer Size: 8"
Vintage: 2004
(3) Coaters / (3) Developers, 8"
General system configuration:
Left to right
Carrier type: Notch type, (25) Slots
System power rating: AC 208V, 3-Phase for system, 173A (Max)
Loading configuration:
(4) Loaders
Uni-cassette
Software version: 3.04.130
(3) Main controllers
Main system details:
Main frame with system controller
Carrier station
Type: Normal cassette type
Cassette: (25) Slots
Coater unit details (2-1, 2-2 module):
(8) Dispense nozzles
with temperature controlled lines for etch unit
(16) RRC Pumps
PR Suck-back valve: (16) AMC Suck-back valves
Rinse nozzle: Back / EBR / Solvent bath for etch unit
Rinse system: 3-Liter 2-tank buffer tank system
Programmable side rinse
PR Supply (1, 2, 3, 4, 5, 6, 7, 8): (8)Bottles (1-Bottle / 2-Nozzle)
Solvent Supply
CCSS Supply
E.B.R Flow system: CCD Type
Drain type: Direct drain system (Including a pump)
TCT Unit details (3-2 Module):
(3) Dispense nozzles with temperature controlled
Resist 1, 2 RRC pump (F-T201-1)
Resist 3 RDS pump (R GEN tm-01)
PR Suck-back valve: (3) AMC Suck-back valves
Rinse nozzle: Back / EBR / Solvent bath for etch unit
Rinse system: 3-Liter 2-tank buffer tank system
Programmable side rinse
PR Supply (1, 2, 3): (3) Bottles (1-Bottle/1-Nozzle)
Solvent supply: CCSS Supply
E.B.R Flow system: CCD Type
Drain type: Direct drain system (Including a pump)
Developer unit details (3-1, 3-2, 3-4 Module):
(1) LD Nozzle for each unit
(3) Dispense nozzles with temperature controlled
(1) Stream nozzle for DI rinse
2-Point for back side rinse on each unit
Developer system: (3) 3-Liter 2-tank buffer tank system
Developer supply: CCSS Supply
Developer temperature control system
Drain: Direct drain
I/F Wafer stage type: NIKON Type (S206)
(2) Adhesion units details:
HMDS Tank with float sensor in system
HMDS Supply: Local canister supply
(3) Precision hot plate stations (PHP)
(6) Precision chilling hot plate stations (PCH)
(2) Cup washer holders (CWH)
(4) High chill plate stations (HCP)
(1) Chill plate station (CPL)
(2) High temp hot plate stations (HHP)
(5) Low temp hot plate stations (LHP)
(2) Transition stages (TRS)
(1) Transition chill plate (TCP)
Chemical cabinet #1: PR Bottle & 2-1, 2-2 COT pump
HMDS Buffer tank assembly
Solvent buffer tank
Solvent filter assembly
Developer buffer tank & developer / DI filter assembly
Chemical cabinet #2: HMDS Canister tank
Temperature & humidity controller:
Type: SHINWA ESA-8Series (TEL OEM)
Temperature control unit (TCU):
Type: TEL OEM
AC Power box:
AC 200/220V
Full load current: 173A
System configuration:
(1) UNC: Uni-cassette stage
(1) TCT: TARC Process station
(2) ADH: Adhesion process stations
(3) PHP: Precision hot plate stations
(6) PCH: Precision chilling hot plate stations
(2) CWH: Cup washer holders
(2) SHU: Shuttles
(2) COT: Coat process stations
(3) DEV: Develop process stations
(4) HCP: High speed chill plate stations
(1)CPL: Chill plate station
(2) HHP: High temperature hot plate stations
(5) LHP: Low temperature hot plate stations
(2) TRS: Transition stages
(1) TCP: Transition chill plate
Other system details:
In-Line
CSB, PRB1, PRB2, IFB
Power box, T&H Controller 1
Chemical box 1, 2
Thermo-controller 1
2004 vintage.
TEL / TOKYO ELECTRON Clean Track ACT 8 is a photoresist equipment designed specifically for LCD panel production lines. Photoresist systems use ultraviolet light (UV) to expose photoresist material coated onto the surface of a substrate, usually glass. If the substrate is exposed to light of appropriate wavelength, the resist decomposes, leaving a pattern of exposed and unexposed areas. This photoresist technology is used in LCD panel production lines to create an ultra-fine pattern of electrodes on the LCD panel. TEL Clean Track ACT 8 provides reliable pattern formation for LCD production lines. It is a modular system consisting of an exposure unit, a focus and alignment unit, a substrate stage module, a measurement and control unit, and a supporting control machine. The exposure unit utilises a powerful UV-LED light source and a variety of optics and galvanometers to provide superior exposure stability with highly precise alignment and aberrations control. The focus and alignment tool allows for precise and repeatable pattern positioning, allowing for accurate and precise electrode pattern formation. The substrate stage module provides precise motion speed and precision, allowing for extremely precise pattern formation. The measurement and control unit automatically adjusts and controls the exposure levels of each exposure unit. The supporting control asset synchronizes the hardware components and provides a user-friendly interface that allows users to monitor, adjust, and analyze the exposure levels of each exposure unit on the production line. TOKYO ELECTRON Clean Track ACT 8 is designed to maximize productivity while offering superior resist definition and pattern accuracy. It offers high-resolution patterns with a minimum line width of 0.1 microns and a uniformity of ±2%. It also provides fast exposure times to meet the high demands of LCD production lines. With its superior exposure uniformity and high precision, Clean Track ACT 8 is an excellent choice for LCD panel production lines.
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