Used TEL / TOKYO ELECTRON Clean Track ACT 8 #9191941 for sale
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ID: 9191941
Wafer Size: 8"
Vintage: 2015
Photoresist processing system, 8"
Carrier station (CSB)
With 1 x 4 loader
Pick up stage
Coater unit (COT) for resist coating
Resist dispense line
With TEL HPT Resist pump (LOR 10A)
Adjustable suck-back valve
Resist consumption feature
Backside rinse
Programmable topside edge bead remover
Programmable dummy dispense
Direct drain
Yellow LED light module in spinner unit
PTI Active mass flow control
Polymide coater unit (PCT):
Pressurized dispense system for polymide:
Lit-lifting mechanism
With pressure sensor system
Backside rinse
Programmable topside edge bead remover
Programmable dummy dispense
Direct drain
Yellow LED light module in spinner unit
PTI Active mass flow control
Developer unit (DEV) for puddle develop
Super H nozzle (TMAH)
Top and backside rinse (DIW)
Yellow LED light module in spinner unit
Direct drain
Polyimide developer unit (PI DEV):
Spray nozzle set for spray develop (Cyclopentanon)
Straight nozzle for puddle develop (Cyclopentanon)
Spray nozzle set for spray rinse (PGMEA)
Top and backside rinse (PGMEA)
Yellow LED light module in spinner unit
Direct drain
Central Supply PCS (Pump chemical supply system) for Cyclopentanon
With two-canister auto-switch system
Central supply two-tank auto-supply system (PGMEA and TMAH)
Thermal units:
Chill plate process station (CPL)
Low temperature hot plate process station (LHP)
Heater cover hot plate process station (HCH)
Transition stage (TRS)
Transition chill plate (TCP)
Cup washer holder (CWH)
AC Power box: 208VAC
Thermostatic water supply unit
Side cabinet for polyimide & PGMEA Supply
Chemical cabinet for Cyclopentanon & TMAH supply
Cup temperature & humidity controller CP-2 (Coater & PI coater unit)
CE Marked
2015 vintage.
TEL / TOKYO ELECTRON Clean Track ACT 8 is an advanced photoresist equipment that is designed to provide superior cleanroom performance and throughput. The system utilizes an automatic track unit which combines an active cleaning process and chemical-free storage and transport of photoresist wafers. An optimized resist supply machine further ensures high productivity, high uniformity and minimal wafer contamination. TEL Clean Track ACT 8 includes a susceptor tool that is designed to resist particle deposition. The asset is equipped with several features to ensure optimal performance. A specialized coating process is implemented to ensure superior adherence of photoresist to the wafer surface, guaranteeing total coverage of the entire surface area and uniform film thickness. An automated model recognizes the size of the wafer and identifies the specified resist type. The modular equipment also has a flexible capacity that can be adjusted on the fly based on current requirements and wafer size. TOKYO ELECTRON Clean Track ACT 8's proprietary resist system brings several advantages. The cleaning liquid is an aqueous solution that minimizes the introduction of organic substances and is generated within the unit on demand. This ensures further protection from contamination. A pre-programmed rate of liquid consumption optimizes the machine for high speed processing. The resist supply tool remains hermetically sealed to protect the exposed resist from contamination at all times. Additionally, Clean Track ACT 8 is equipped with several advanced safety features. A built-in low-pressure resist spray asset reduces the risk of exposure to airborne particles, protecting the substrate wafer from possible contamination. The model is also constructed for superior performance in cleanroom environment and boasts a narrower operating range, from 0.2 to 0.6 bar. TEL / TOKYO ELECTRON Clean Track ACT 8's unique design allows for improved throughput and minimal wafer contamination, achieving high yields for a variety of substrates including silicon, ceramic, and quartz. Flexible capacities and automated processes make TEL Clean Track ACT 8 a cost-effective solution for cleanroom operations that demand high performance from their photoresist equipment.
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