Used TEL / TOKYO ELECTRON Clean Track ACT 8 #9198616 for sale

TEL / TOKYO ELECTRON Clean Track ACT 8 is a photoresist equipment that utilizes a maskless exposure system to produce high quality lithography patterns. It uses a multicore beam of laser light to irradiate a positive or negative photoresist layer on a wafer surface. The laser light is modulated by liquid crystal shutters, allowing the patterning optoelectronics to accurately form the desired pattern. The unit also includes a quartz substrate stage which can be moved automatically without user intervention to adjust the exposure area during patterning. The laser source has low power consumption and is Ozone-free. The machine is designed to produce high resolution patterns with precise alignment and handling of various photoresists. It supports clean room operation with low particle contamination and minimal static electricity generation. The tool is highly efficient and cost-effective, eliminates the need for expensive mask making, and reduces the lengthy etching and dry cleaning process steps. The asset also allows photoresists to be exposed from negative to positive to create multi- layer patterns without additional process steps. For each photoresist, the model is also designed to optimize process conditions and process settings which can be adjusted for various process requirements. The equipment can store up to 8 recipes in its memory and can adjust exposure time and laser power depending on the process settings. In addition, the system also includes a real time monitor so that users can easily adjust to changing environmental conditions and keep track of the progress of the exposure patterning. This photoresist unit offers excellent resolution, alignment, and precision patterning of photoresists. The low power consumption and ozone free laser source make it suitable for cleanroom applications, while its cost effectiveness and time saving features make it a valuable tool for researchers and manufacturers. Additionally, the machine's built-in monitor and recipe storage make it an extremely efficient and reliable solution for manufacture of lithography photographic masks.