Used TEL / TOKYO ELECTRON Clean Track ACT 8 #9198618 for sale

TEL / TOKYO ELECTRON Clean Track ACT 8 is a high-precision photoresist equipment that uses advanced technology to provide a wide range of benefits for the production of high-end microelectronic devices. This system provides better process control and accuracy which results in increased productivity and better quality. It is typically used for the production of thin-film transistors and integrated circuits. TEL Clean Track ACT 8 unit consists of two key components: a patented electron-beam exposure source and a proprietary software-controlled precise multi-axis exposure mechanism. The electron-beam exposure source uses an electron gun to produce a high-resolution mask-to-image pattern which is transferred to photoresist material. The patented exposure source is designed to accurately transfer the image to the photoresist material by minimizing exposure energy loss due to the imaging medium. This results in enhanced image resolution and precise image registration. The second component of the machine is the proprietary software-controlled precise multi-axis exposure mechanism which is responsible for delivering the mask-to-image pattern with extremely accurate pinpoint accuracy. This component is equipped with a titanium trailer which allows for linear motion control in three axes with an accuracy of less than 0.5 microns. This enables photo-alignment to occur with exacting accuracy, resulting in a high-resolution image with excellent registration. In addition, TOKYO ELECTRON Clean Track ACT 8 tool can be fitted with a number of different add-on capabilities such as a wafer pre-bake module, temperature compensation asset, high-precision shutter model and more. This allows the equipment to be customized to meet specific production requirements. Clean Track ACT 8 photoresist system features cutting-edge technology that provides an exceptionally high level of accuracy and speed in the production of microelectronic devices. This unit allows for faster production times, higher-quality images, and increased productivity in the production of thin-film transistors and integrated circuits. It is an ideal machine for the fabrication of extremely accurate and finely detailed microelectronic devices.