Used TEL / TOKYO ELECTRON Clean Track ACT 8 #9235802 for sale

TEL / TOKYO ELECTRON Clean Track ACT 8 is a photoresist equipment that provides a cost-effective and enhanced photoresist platform for the semiconductor industry. It uses a combined scanner and Auto Mask Chuck (AMC) platform to perform scan-to-mask registration and exposure tasks in one platform. This platform is designed to reduce the cost of operation, improve the photoresist system performance, and improve the throughput by reducing the time to process one wafer. TEL Clean Track ACT 8 uses innovative technology to improve the accuracy and throughput of exposure processes. The Auto Mask Chucks (AMC), which are used to secure the masks, feature high-stability micro-protrusions to ensure the masks are aligned correctly and accurately. The embedded scanner also incorporates autofocus and scanning speed to improve throughput by accelerating scan operations. TOKYO ELECTRON Clean Track ACT 8 features a large capacity pot assembly. It holds up to 12 masks or 3 sheets of wafers and is separated into two chambers. The first chamber intakes masks for exposure and the second reduces the non-recurrent dispense bias. It also provides superior performance by rapidly exchanging the chambers between exposure operation and dispense dilution, thus eliminating the need for throughput reducing re-calibration. Clean Track ACT 8 features a 5 megawatt pulsed light source (PLS) for mask exposure. It provides several advantages such as a low background source for reduced film absorption and an integrated design for high stability. Additionally, it incorporates active process monitoring in order to maintain a constant light output over time and ensure accurate exposure. In conclusion, TEL / TOKYO ELECTRON Clean Track ACT 8 unit has been developed using innovative technologies to increase the throughput and cost-effectiveness of photoresist systems. It incorporates a combined scanner and auto mask chuck, as well as a large capacity pot assembly and a 5 megawatt PLS for mask exposure. These features enable the machine to accurately and rapidly process wafers and improve the cost and performance of photoresist processes in the semiconductor industry.