Used TEL / TOKYO ELECTRON Clean Track ACT 8 #9237166 for sale

TEL / TOKYO ELECTRON Clean Track ACT 8 is a photoresist equipment developed by TEL, a leading manufacturer of integrated circuit (IC) fabrication equipment. TEL Clean Track ACT 8 features a four-point contact system and a high performance, low angle cleaning procedure. In order to keep the highest standard of photolithography fabrication products, TOKYO ELECTRON Clean Track ACT 8 helps to maintain a clean substrate surface, while ensuring stable and reliable resist growth. Clean Track ACT 8 unit is designed to improve the photolithography layers of microprocessors and other IC sensors, by providing highly accurate, high resolution patterning. To do this, the machine uses two main components: an optical stepper and an ultraviolet (UV) light source. The optical stepper consists of two mirrors and lenses that create the desired pattern for the photoresist to be deposited on the substrate. The UV light source provides a uniform illumination of the substrate. The tool provides a low angle cleaning procedure, which ensures that surface contaminants do not interfere with the photolithography layers. It can clean the surface even at the most critical stage, when the patterning layers are being formed. The low angle cleaning procedure of TEL / TOKYO ELECTRON Clean Track ACT 8 helps to remove particles, adsorbates, and other materials that could otherwise cause defects. The four-point contact asset of TEL Clean Track ACT 8 aligns the substrate on the precision slots of the optical stepper. The model uses a precision alignment equipment to precisely align the substrate to the moving optical components for accurate patterning of the photoresist film. This ensures that the film is evenly and radially applied on the substrate. TOKYO ELECTRON Clean Track ACT 8's process monitoring and control system continuously monitors all levels of operations and parameters, thus guaranteeing consistent and repeatable resist thickness. This helps to ensure enhanced yield and defect-free fabrication results. Clean Track ACT 8 is a powerful method of photoresist deposition for IC fabrication. It helps to maintain substrate cleanliness and ensure stable and reliable resist growth while providing high resolution patterning with minimal defects.