Used TEL / TOKYO ELECTRON Clean Track ACT 8 #9241869 for sale
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ID: 9241869
Wafer Size: 8"
(2) Coater / (2) Developer system, 8"
I-Line
Single block system
Wafer flow: Left to right
Process block: Single block system
Block 1(C/S Blk):
CS Add on board missing
Main controller: ACT #2
Y,Z,Th Motor, X,Y,Z,Th Drive
Touch screen
Pincette
Block 2(P/S Blk)
(2) Spinner I/O boards missing
(2) Coater units (2-1, 2-2)
Direct drain type
(2) PR Nozzle assemblies
(4) Back rinses
(2) EBR Nozzles
(2) Out cup assemblies
(2) Nozzle changer motors
(2) Spin motors & drivers
(2) Developer units: (2-3, 2-4)
(2) Spinner I/O boards missing
(4) Back rinses
(2) H Nozzle assemblies
(2) Out cup assemblies
(2) Spin motors & drivers
Oven unit:
(7) LHP/ Low temperature hot plates
(4) CPL/ Chill plates
TCP
(2) TRS / Transfer stations
(2) ADH/ Adhesion process stations
PRA / Process block robotics arm:
Missing part: Pincette
TH Drive
PRA Motor
Missing parts:
(4) ADH Inject valves
(10) Air valve (AMDZ1-X61)
(2) DEV Drine bottles
Power cable
THC: T&H-NRE-2-A-00
Power box: PB2-U200-03-DV2
TCU.
TEL / TOKYO ELECTRON ACT 8 is a Photoresist Equipment manufactured by TEL Ltd. (TOKYO ELECTRON). It is designed for use in semiconductor and other related industries for etching or coating of wafers up to eight inches in diameter. It utilizes a laser-direct imaging system to deliver accurate and precise images to photoresist coated wafers. The unit is composed of three essential components: the scan head, control card, and active chamber. The scan head uses laser light from two sets of lasers to perform the imaging of the photoresist coated wafers. The control card enables the scan head to produce a beam with proper pitch spacing and resolution. It also contains digital circuit boards and receivers that detect, in real-time, the position of the beam, thereby adjusting the resolution if needed. The active chamber facilitates loading and unloading of wafers from the machine as well as the activation of the photoresist. The tool utilizes a novel photoresist asset known as the dual state resist (DSR) feature. This feature enables the user to apply two different types of photoresist to the same wafer while adjusting the feature width between the two applications. To provide a precise and reliable imaging of the photoresist coated wafers, TEL ACT 8 utilizes several advanced technology features, such as advanced high optical power tuning, laser wavelength flexibility, multi-level center chirality and field tuning. Additionally, the photoresist has high sensitivity and excellent impedance control to provide an accurate result even when the laser beam's intensity changes. The model also has an extensive automatic control equipment that enables the user to submit the inspected parameter sets via the graphic user interface with the click of a button. This system then connects all of the relevant devices and dictates the process parameters with complete accuracy. Another important aspect of the unit is its safe and efficient SEH operation software. This software can be accessed through a PC, so the user can communicate with the machine or other connected devices, saves data for tool recall and operate the asset remotely. The SEH operation software also enables the user to monitor all activity taking place within the model in real time. Finally, TOKYO ELECTRON ACT 8 provides a user-friendly environment and auto-maintenance feature, allowing its users to increase productivity and reduce cost in terms of labor and energy.
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