Used TEL / TOKYO ELECTRON Clean Track ACT 8 #9248792 for sale
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ID: 9248792
Wafer Size: 8"
Vintage: 1999
(2) Coater / (2) Developer system, 8"
Direction: Right to left
(25) Slots
(4) Uni-cassette loaders
Main controller: Type 2
CSB
PRB1
IFB
Power box
T&H Controller
Chemical box
Thermo controller
Main system:
Main frame with system controller
Carrier station:
Type: Normal uni-cassette
(4) Cassette stages
Pick-up cassette
Uni-cassette system
Coater unit (2-1, 2-2):
(4) Dispense nozzles with temperature controlled lines for etch unit
RRC Pump
Rinse nozzle: Back / EBR / Solvent bath for etch unit
Rinse system: 3 Liters (2) Tanks buffer tank system
P.R Suck-back valve type: Air operation suck-back valve
Programmable side rinse
Drain: Direct drain
Developer unit (2-3, 2-4):
Steam nozzle for each unit
(2) Stream nozzles for DI rinse and 2-points for back side rinse on each unit
Developer system: 3 Liters (2) tanks buffer tank system
Developer temperature control system
Drain: Direct drain
Interface type: ASML
(8) Low temperature hot plates (LHP)
(4) Chill plates (CPL)
(4) Chilling hot plate process stations (CHP)
TCP Module
(2) TRS Modules
WEE (wafer Edge Exposure) Module
Wafer type: Notch
Chemical cabinet
TEL / TOKYO ELECTRON Temperature Control Unit (TCU)
AC Power box
Missing parts:
2-5, 2-17 ADH Module assemblies
Circulator pump
IRA T Axis motor driver
WEE CCD Board
WEE X Axis motor driver
(2) 2-2 COT P.R Pumps
(2) Developer buffer tanks
2-2 Spin chuck
T&H Controller
Main controller hard disk
System power rating: AC 208V, 3-Phase
1999 vintage.
TEL / TOKYO ELECTRON Clean Track ACT 8 is an advanced photoresist equipment for semiconductor processing. It is designed to provide superior performance in challenging fine line processes, particularly in advanced 14nm and below process nodes. TEL Clean Track ACT 8 is capable of running at speeds of up to 8.4 m/s, while maintaining a uniform layer deposition across the entire surface of a substrate. Its advanced dispense system features a modified Liquid-Gating Technology (LGT) that ensures uniform film deposition across the entire surface of the wafer. The LGT also enables a smaller deadband size, while at the same time improving process throughput. TOKYO ELECTRON Clean Track ACT 8 also features a novel CozFlow Dispense Technology which uses a special nozzle to precisely control the amount of dispense and direction of flow of the photoresist. This allows for greater accuracy in film deposition. The performance of Clean Track ACT 8 can be further enhanced by the use of the optional Clean Track Precision Point Laser Unit. This proprietary laser machine offers an improved accuracy and uniformity in the application of photoresist films on wafer surfaces by means of a solid-state laser that is adjusted to obtain the desired resist parameters. The results obtained from this tool are superior to those obtained with conventional optical lithography techniques. TEL / TOKYO ELECTRON Clean Track ACT 8 has an advanced automated cleaning asset that allows for a high-contrast etching process. This clean-up model is designed to remove the residues of any chemical used in the fabrication process and prepare the wafer for further processing. TEL Clean Track ACT 8 also boasts of a number of other features that make it an ideal solution for advanced semiconductor processes. These include: an integrated real time process monitor that shows the progress of the wafer fabrication, an easy-to-operate touch screen, and the ability to adjust the width of the resist film to accommodate the desired pattern size. The advanced features of TOKYO ELECTRON Clean Track ACT 8 make it an ideal solution for complex and precise semiconductor fabrication processes, particularly for advanced 14nm and below process nodes. By using Clean Track ACT 8, engineers and technicians are able to accurately and uniformly pattern their designs, while achieving consistent results.
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