Used TEL / TOKYO ELECTRON Clean Track ACT 8 #9248792 for sale

TEL / TOKYO ELECTRON Clean Track ACT 8
ID: 9248792
Wafer Size: 8"
Vintage: 1999
(2) Coater / (2) Developer system, 8" Direction: Right to left (25) Slots (4) Uni-cassette loaders Main controller: Type 2 CSB PRB1 IFB Power box T&H Controller Chemical box Thermo controller Main system: Main frame with system controller Carrier station: Type: Normal uni-cassette (4) Cassette stages Pick-up cassette Uni-cassette system Coater unit (2-1, 2-2): (4) Dispense nozzles with temperature controlled lines for etch unit RRC Pump Rinse nozzle: Back / EBR / Solvent bath for etch unit Rinse system: 3 Liters (2) Tanks buffer tank system P.R Suck-back valve type: Air operation suck-back valve Programmable side rinse Drain: Direct drain Developer unit (2-3, 2-4): Steam nozzle for each unit (2) Stream nozzles for DI rinse and 2-points for back side rinse on each unit Developer system: 3 Liters (2) tanks buffer tank system Developer temperature control system Drain: Direct drain Interface type: ASML (8) Low temperature hot plates (LHP) (4) Chill plates (CPL) (4) Chilling hot plate process stations (CHP) TCP Module (2) TRS Modules WEE (wafer Edge Exposure) Module Wafer type: Notch Chemical cabinet TEL / TOKYO ELECTRON Temperature Control Unit (TCU) AC Power box Missing parts: 2-5, 2-17 ADH Module assemblies Circulator pump IRA T Axis motor driver WEE CCD Board WEE X Axis motor driver (2) 2-2 COT P.R Pumps (2) Developer buffer tanks 2-2 Spin chuck T&H Controller Main controller hard disk System power rating: AC 208V, 3-Phase 1999 vintage.
TEL / TOKYO ELECTRON Clean Track ACT 8 is an advanced photoresist equipment for semiconductor processing. It is designed to provide superior performance in challenging fine line processes, particularly in advanced 14nm and below process nodes. TEL Clean Track ACT 8 is capable of running at speeds of up to 8.4 m/s, while maintaining a uniform layer deposition across the entire surface of a substrate. Its advanced dispense system features a modified Liquid-Gating Technology (LGT) that ensures uniform film deposition across the entire surface of the wafer. The LGT also enables a smaller deadband size, while at the same time improving process throughput. TOKYO ELECTRON Clean Track ACT 8 also features a novel CozFlow Dispense Technology which uses a special nozzle to precisely control the amount of dispense and direction of flow of the photoresist. This allows for greater accuracy in film deposition. The performance of Clean Track ACT 8 can be further enhanced by the use of the optional Clean Track Precision Point Laser Unit. This proprietary laser machine offers an improved accuracy and uniformity in the application of photoresist films on wafer surfaces by means of a solid-state laser that is adjusted to obtain the desired resist parameters. The results obtained from this tool are superior to those obtained with conventional optical lithography techniques. TEL / TOKYO ELECTRON Clean Track ACT 8 has an advanced automated cleaning asset that allows for a high-contrast etching process. This clean-up model is designed to remove the residues of any chemical used in the fabrication process and prepare the wafer for further processing. TEL Clean Track ACT 8 also boasts of a number of other features that make it an ideal solution for advanced semiconductor processes. These include: an integrated real time process monitor that shows the progress of the wafer fabrication, an easy-to-operate touch screen, and the ability to adjust the width of the resist film to accommodate the desired pattern size. The advanced features of TOKYO ELECTRON Clean Track ACT 8 make it an ideal solution for complex and precise semiconductor fabrication processes, particularly for advanced 14nm and below process nodes. By using Clean Track ACT 8, engineers and technicians are able to accurately and uniformly pattern their designs, while achieving consistent results.
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