Used TEL / TOKYO ELECTRON Clean Track ACT 8 #9269251 for sale

TEL / TOKYO ELECTRON Clean Track ACT 8 is a photoresist equipment that combines high precision control and measurement with reliable resistance to a wide range of chemicals. It enables users to efficiently produce process-critical thin-film layers with precision and accuracy, without the need for further cleaning. TEL Clean Track ACT 8 system is designed around two-axis image-capturing optical micrometers. This allows for the XY coordinate positioning of glass slide substrates with a resolution up to 8 microns, enabling the photoresist process to be conducted with accuracy for thin-film, device-level applications. The unit is also equipped with an anti-reflection coating to reduce errors caused by the reflection of light from the surface of the substrate. The photoresist used in TOKYO ELECTRON Clean Track ACT 8 machine uses a unique combination of chemical and mechanical processes. This includes direct dispensing of the solution, uniform resist layer coverage, and optimal transfer of spinning force for effective spinning force control. All of these processes are inherently related to one another in order to create an efficient and reliable photoresist tool. The asset also employs a unique cleaning model for cleaning the substrates and resist following the photoresist process. This cleaning equipment uses alcohol and sonic cleaning agitators to ensure the highest level of cleanliness after photo exposure. The alcohol cleaning system is specifically designed to reduce contamination on the substrates and resist. To further ensure the accuracy of the results, Clean Track ACT 8 unit also provides an automatic "quality check" of each resist layer during the spinning process. This helps ensure that each layer is clean and conforms to the desired standard. The unique capabilities of TEL / TOKYO ELECTRON Clean Track ACT 8 machine have enabled users to produce high-level process-critical thin-film layers, with precision and accuracy. The tool also offers reliable resistance to a broad range of chemicals, ensuring that the results are always consistent and dependably clean.