Used TEL / TOKYO ELECTRON Clean Track ACT 8 #9269257 for sale

TEL / TOKYO ELECTRON Clean Track ACT 8 is a photoresist equipment designed for processing of advanced materials. It is designed to provide the utmost in cleanroom productivity and performance. The unit is equipped with a wide variety of features that enable it to operate at the highest level of precision. The Clean Track system uses an inverted cassette unit that ensures the utmost in uniformity and consistency across a variety of substrates. The machine is designed to allow multiple substrates to be processed simultaneously, resulting in excellent throughput. The cassette contains a double-sided substrate holder, which allows for extremely low damage and uniformity during processing. The tool also enables reliable substrate surface cleaning via a dynamic droplet dispersion asset. The model employs a unique air purge solution to remove all particles from the processing area, resulting in maximum particle retention. The equipment features a wafer size selection option that allows for production line customization. It also offers an automatic substrate indexing system, which enables easy handling and processing of wafers and substrates. The unit utilizes two-dimensional imaging technology to ensure both uniformity and accuracy of registration. The photoresist machine is also equipped with a four-stage optical alignment tool, which allows for precise alignment of the exposure optics. The asset supports exposure times of up to 10 ms with a resolution of 10µm. The unit is also equipped with a substrate temperature control model, which ensures uniform substrate temperature and curing of resists. The equipment is compatible with many photoresist materials, including positive and negative resists. It has been designed to withstand a wide range of environmental conditions, allowing for extended periods of use. The unit is also equipped with a high-performance generator, which ensures the highest quality of exposure. The Clean Track system is designed to provide high yields and precise control with an improved cleaning process. Its advanced design ensures maximum precision and reliability for even the most complex processing tasks. It is the ideal unit for processing the most advanced materials.