Used TEL / TOKYO ELECTRON Clean Track ACT 8 #9282574 for sale

TEL / TOKYO ELECTRON Clean Track ACT 8 is a photoresist equipment designed to provide a reliable and effective process for patterning advanced microelectronic devices. It allows users to cleanly transfer photoresist patterns onto substrates of nearly any shape or size, including hard-to-pattern recessed or raised device regions. The system is composed of several components, including a precision photomask aligner, a stepper/scanner, and an electron beam coater/developer. The precision photomask aligner facilitates accurate alignment of the photomask to the substrate substrate, ensuring that the patterns are effectively transferred. Additionally, the photomask aligner can be set to activate an alignment shutter which will quickly open and close for precise alignment. The stepper/scanner allows for automated exposure of the photoresist patterns onto the substrate. It contains ergonomically designed wafer handling and substrate scanning components and provides optical imaging capabilities for transparent and opaque substrates. The last component of the unit is the electron beam coater/developer which is used to apply and develop the photoresist coating to the substrate. This component is designed to evenly and reliably apply the photoresist. Its electron beam is highly accurate, allowing for accurate patterning with sharp, well-defined edges. Additionally, its photoresist development process is fast and efficient. TEL Clean Track ACT 8 provides the optimal combination of performance and reliability for patterning modern electronic devices. Its components ensure precise alignment, accurate exposure, and even and reliable photoresist application and development. As a result, the machine can be used to pattern microelectronic devices which require high precision and reliability.