Used TEL / TOKYO ELECTRON Clean Track ACT 8 #9300430 for sale

TEL / TOKYO ELECTRON Clean Track ACT 8 is a state-of-the-art photoresist equipment designed for the high-quality photolithography process. This system facilitates various processing steps, including spinning, baking, and developing, all within a single automated module. It is specifically designed to provide optimum control and high yields during high precision lithographic processes. TEL Clean Track ACT 8 is equipped with a high-precision motion controller and a Motion Visioning Unit (MViS). This ensures the precise and highly reproducible positioning of the wafer stage even during long runs. Furthermore, the machine employs various advanced technologies, including a high-speed coarse movement controller, a fast linear encoder, and a Closed-Loop Axis Drive (CLAD). This combination of features ensures smooth, reliable, and accurate motion control, as well as precise positioning of the wafer stage. TOKYO ELECTRON Clean Track ACT 8 offers superior substrate cleaning capabilities; it is equipped with a slide-able trapezoidal blade cleaning station. This station uses abrasive blades to gently remove particles from the substrate surface and reduce edge effects. It is further equipped with a particle and contamination monitoring tool for continuous effective process control. This monitoring asset utilizes on-site ionizer and air exhaust systems to ensure superior substrate cleanliness. In addition to the motion control and cleaning functions, Clean Track ACT 8 offers a wide variety of imaging and patterning options. It is equipped with both single- and double-fed head scanners for rapid imaging of large substrates, and also includes a wide variety of patterning methods such as Exposure Laser Scanning (ELS), contact PR Copies (PRC), and built-in off-axis auto-alignment for defining precise image patterns. TEL / TOKYO ELECTRON Clean Track ACT 8 is a comprehensive photoresist model that has been designed to deliver high-quality, reproducible lithographic results. It offers excellent motion control, substrate cleaning, and imaging capabilities, allowing users to achieve precise and accurate photolithography processes. Its advanced technological features and wide variety of patterning options make it a great choice for high-precision processes, ensuring superior yields and process control.