Used TEL / TOKYO ELECTRON Clean Track ACT 8 #9355794 for sale

TEL / TOKYO ELECTRON Clean Track ACT 8 is a photoresist equipment for advanced photolithography processes. It is a premier system, leveraging the latest technologies to produce clean, accurate, and precise photolithography processes. The ACT 8 can process any type of photomask with resist layers from 50nm up to two microns thick, and supports feature sizes down to 0.25 microns. The unit provides accuracy of up to 0.15 microns, enabling the production of fine-line patterns with clean edges. The machine employs laser-based projection exposures, ablation processes, and multiple options for blanket etches and liquid coatings. The optical pathway utilizes high NA space-illumination lenses that utilize patented lighting features for illumination spots as small as 0.15 microns. The laser tool can provide a range of ultra-high-intensity exposures or overdrive multiple sequential exposures with varying energy levels to produce precise patterns. The asset also employs special parameters to shape the exposure profile of the laser beam, allowing it to expose and etch the photomask without smearing the exposure pattern. TEL Clean Track ACT 8 photoresist model also employs a controlled-flow liquid coating process to improve the uniformity of the photoresist layers. The liquid coating process includes parameters to control the viscosity and time of exposure as well as temperature control for improved uniformity and accuracy. The equipment even uses ion implant to improve adhesion and improve pattern dimensions. TOKYO ELECTRON Clean Track ACT 8 showcases central computer control and advanced process monitoring capabilities. The system also features extensive parameter databases for accurate process control, as well as logging capabilities for SPC. The unit has been designed with a modular process concept for easy maintenance, and is protected against dust and chemical compounds for machine integrity. Overall, Clean Track ACT 8 photoresist tool is the perfect solution for advanced photolithography processes that require precision and accuracy.