Used TEL / TOKYO ELECTRON Clean Track ACT Lithius #293649381 for sale

TEL / TOKYO ELECTRON Clean Track ACT Lithius is a photoresist equipment designed for semiconductor device fabrication. It is an advanced, high-performance tool for uniform and precise removal of photoresist residues. It uses an automated tracking system to ensure consistent performance and minimize particle contamination in production. TEL Clean Track ACT Lithius utilizes a variety of different technologies to remove the photoresist from the semiconductor device. First, a series of chemical solutions are used to dissolve the material. After which an isopropyl alcohol rinse helps ensure the material is completely gone. Then, a high-energy plasma is used to completely etch the surface of the device. Finally, a high-temperature, low-pressure gas is used to scrub the surface and comprehensively remove any remaining photoresist traces. The unit includes a controller, wafer handler, chemical delivery, scrubbing station and laser etch station. The main objective of the machine is to minimize particle contamination by providing more precise handling of the wafers. The wafer handler allows the tool to provide precise and uniform photoresist cleaning performance along the whole wafer surface. It also includes an integrated vision asset to identify any particles that may contaminate the wafer during processing. The chemical delivery offers precise and precise control of chemical reactants, as well as a reagent management model to save time and cost, as well as a chemical automation equipment to ensure minimal waste. The plasma etch station uses a high frequency plasma technique which is designed to quickly and efficiently remove the photoresist residues from the surface. Finally, the scrubbing station uses a low-pressure gas stream to flush out any remaining residues for a perfectly clean wafer. TOKYO ELECTRON Clean Track ACT Lithius is a highly advanced, effective and reliable tool for semiconductor device fabrication. It is designed to reduce particle contamination and deliver superior performance. It enables precise cleaning to be carried out quickly and efficiently, ensuring consistently high quality device fabrication.