Used TEL / TOKYO ELECTRON Clean Track Lithius Pro V-i #9397199 for sale

TEL / TOKYO ELECTRON Clean Track Lithius Pro V-i is a commercially available photoresist equipment designed to provide high photoresist processing quality in the production of semiconductor devices. The system is designed to produce high-volume, high-quality photoresists even in difficult applications. The unit incorporates the latest in advanced technology for photoresist processing, and features a high-precision optical machine that is capable of resolving features down to 30 nm. This tool is designed to ensure quality and uniformity during the photoresist lifting process. The photoresist asset utilizes a resistive substrate with high temperature, high reliability, and high adhesion capabilities to ensure consistent results, even when exposed to high temperatures. The model also includes a sophisticated safety equipment to monitor the chamber cleanliness and process parameters. The integrated Pro V-i safety system utilizes a comprehensive set of sensors to monitor temperature, pressure, and other operating parameters, and can protect the photoresist unit from any damage. TEL Clean Track Lithius Pro V-i machine can be employed in a variety of different production processes, including photolithography, epoxidation, and spin-on-deposition. It is compatible with a range of conventional photoresist materials, and can be used to achieve a variety of different results depending on the desired application. The tool is also able to handle challenging production processes more easily by employing the latest advances in control and precision, such as allowing for the direct transfer of data produced during the resistive processes. This allows users to optimize their process and enables more rapid production and response times. TOKYO ELECTRON Clean Track Lithius Pro V-i is an extremely reliable and effective photoresist asset, and is capable of producing high volumes and high quality results. This model is a reliable and cost effective solution for many production processes, and can be applied to many different fields to ensure consistent production of quality photoresists.