Used TEL / TOKYO ELECTRON Clean Track Lithius Pro #293802326 for sale

TEL / TOKYO ELECTRON Clean Track Lithius Pro
ID: 293802326
System.
TEL / TOKYO ELECTRON Clean Track Lithius Pro photoresist equipment is a high-end, advanced system designed for photolithography processes. Photolithography is used to create very small and intricate patterns with extremely precise accuracy, and this unit enables this process with some of the highest level accuracy and reliability on the market. The Lithius Pro utilizes photoresist technology to capture and track the patterns that are laid down in the machine. The photoresist consists of a photosensitive material that undergoes a change when exposed to light. The light will be shaped into the pattern required for photolithography and this will be captured within the photoresist. During the process, the pattern will be exposed onto a substrate and at the end of the process the photoresist can be removed to reveal the pattern. The key features of the Lithius Pro are its high precision optical components that allow for the capture of exact positioning of the pattern when it is exposed onto the substrate. The highly accurate sensors used translate the pattern into digital coordinates with +/- 0.15 micron accuracy. Additionally, the high-resolution image capture utilizes highly sensitive CCD cameras and its light source provides bright and uniform illumination, providing a consistent and accurate exposure accuracy. Of course, the main advantage of this tool is its advanced clean track asset. The Clean Track model is designed to prevent particles from forming on the photoresist and contaminating the patterns and this is achieved through a vacuum environment which pulls the air in, capturing particles and protecting the photolithographic process. Overall, TEL Clean Track Lithius Pro photoresist equipment provides users with an accurate and reliable photolithography process, with high precision optical components, accurate sensors and a clean track system for particle prevention. The unit is designed to provide a highly efficient and accurate photolithographic process that can produce consistent results.
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