Used TEL / TOKYO ELECTRON Clean Track Lithius Pro #9218786 for sale

TEL / TOKYO ELECTRON Clean Track Lithius Pro is a piece of advanced photoresist equipment designed to perform highly controlled and precise photolithography processes over a wide range of substrates. Photolithography, also referred to as photomask technology, is the method of transferring patterns between two separate materials using light. The Lithius Pro is capable of providing superior precision for a wide range of photomasking applications due to its high sensitivity to light and chemicals. It is a system that uses both SynchroScan and AsyncScan photomask technologies, which offer simultaneous scanning and processing capabilities for high-speed mask structures. The Lithius Pro is designed for use with a range of photoresist materials, including positive, negative, and spin coating. Photoresist is a film of a photosensitive material that is applied to a substrate, such as a silicon wafer substrate, in order to form a pattern of that material. With a combination of AsyncScan and SynchroScan photomask technologies, the Lithius Pro provides an optimal pattern maintenance and a high aspect ratio accuracy. The unit features a number of advanced features designed for photomask and photoresist applications, such as a dynamic scan speed control machine, an automatic tone adjustment, and an accurate focus detection tool. The Lithius Pro offers easy and precise setup procedures with built-in programs such as a calibration wizard, which simplifies alignment and calibration for maximum accuracy and reproducibility. It also provides a number of standard and special cleaning protocols, such as a vacuum clamping clean cleaning mode, and variable-temperature clean mode for removing grease, dust, and other contamination. The built-in inspection capabilities allow for repeatable and uniform inspection results. These features make the Lithius Pro a powerful tool for precision photomask and photoresist applications. It is capable of performing complex patterning over a wide range of substrates with repeatable results. The asset is designed to installed easily, and offers intuitive control and a wide range of productivity and safety features, making it an ideal choice for those who require high accuracy and efficiency from their photolithography systems.