Used TEL / TOKYO ELECTRON Clean Track Lithius #9195123 for sale

TEL / TOKYO ELECTRON Clean Track Lithius is a photoresist equipment for managing the exposure of various images onto a substrate. This system is used for fine patterning and lithography application in the microelectronics, flat-panel display, optoelectronic device, and semiconductor manufacturing process. TEL Clean Track Lithius unit consists of three parts: the photoresist dispense unit, the image exposure section, and the dry film transfer section. Photoresists are initially dispensed onto the substrate in the photoresist dispense unit, which is integrated into the machine. This unit provides uniform dispensing of photoresists due to its well-controlled pressure and speed, in order to ensure a good starting point for subsequent operations. The second section of the tool is the image exposure section, which then performs the process of exposing the desired image onto the photoresists. This section is equipped with a UV-LED light source, which provides a highly stable UV output with minimal need for calibration. This ensures that all parts of the image requiring exposure are exposed to uniform UV intensity, leading to a precise and repeatable patterning process. Finally, the third section of the asset is the dry film transfer section. This section uses precise dry film transfer robots to produce extremely thin layers of photosensitive film that can be transferred to the substrate. The robots in this section are capable of accurately positioning the dry film onto the substrate while minimizing the risk of contamination or smearing. In conclusion, TOKYO ELECTRON Clean Track Lithius is an effective photoresist model for precise patterning and lithography applications. It is capable of providing uniform dispensing of photoresists, uniform image exposure, and dry film transfer that is accurate and repeatable. These features makes it well suited for use in the microelectronics, flat-panel display, optoelectronic device, and semiconductor manufacturing process.