Used TEL / TOKYO ELECTRON Clean Track Lithius #9213599 for sale

ID: 9213599
Wafer Size: 12"
Vintage: 2006
(3) Coater / (2) Developer system, 12" Single block Main controller Hard Disk Drive (HDD) (2) Robots: 1-0 CRA and 2-0 PRA Power box Chemical box Temperature and Humidity (T&H) TCU 2006 vintage.
TEL / TOKYO ELECTRON Clean Track Lithius is a photoresist equipment that is used to pattern circuits on semiconductor wafers. The system uses a maskless laser lithography technology to write patterns of photoresists, which can then be transferred onto semiconductor wafers. The process involves the application of two or more photoresists to the wafer's surface. The first photoresist is used to deposit a pattern of dots or lines to form circuit elements, while the second photoresist forms a continuous line on top of the patterned lines. This allows for more accurate control over the fine details of a circuit. TEL Clean Track Lithius unit uses a laser beam to carve out high-resolution patterns on the photoresists on the wafer. The depth of the patterns is adjustable for different circuit designs. The photoresist then acts as a mask for etching the semiconductor substrate, where an etching solution is used to create exact patterns on the wafer. TOKYO ELECTRON Clean Track Lithius machine is a reliable solution for producing complex and high-resolution patterns on the wafer. The tool works with a wide range of materials and can be used with various resist design processes. It provides clean and consistent results with superior accuracy. The asset is also highly productive with its high-speed laser scanning and patterning capability. The model has been designed for an easy operation, maintenance and repair. This photoresist equipment is compatible with all major semiconductor fabrication processes such as deposition, oxidation, diffusion and etch. Its wide range of applications makes it ideal for multiple industries including semiconductor, electronic equipment, and automotive manufacturing. The system can easily handle complex patterns and is especially useful in multi-layer photomasks production. In conclusion, Clean Track Lithius is an advanced photoresist unit that can handle a wide range of applications. It is highly reliable and efficient with superior accuracy and high-speed laser scanning capabilities. The machine is easy to operate and maintain and is compatible with all major semiconductor fabrication processes. This makes it an ideal solution for multiple industries for the production of complex patterns on the wafer.
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