Used TEL / TOKYO ELECTRON Clean Track Lithius #9227626 for sale

TEL / TOKYO ELECTRON Clean Track Lithius (CTL) is a dedicated photoresist equipment designed to provide reliable, high-performance photoresist patterning solutions with the flexibility and scalability to meet the demands of emerging technologies. The CTL system offers a comprehensive range of lithography, etching, and surface treatment capabilities that allow for rapid throughput of photoresist reversal and microfabrication processes over a wide range of substrates. The CTL unit supports a wide variety of conventional and advanced photoresist materials such as positive, negative, and advanced silylated and nanoparticle resists, enabling customers to select the optimal resist machine for their specific application needs. CTL is also capable of automatically controlling several processes, including exposure, speed, gas flows, and parameters for each specific type of resist. This allows users to achieve online prototype production or rapid multi-layer process development without manual intervention. The main components of the CTL tool include an integrated workstation with an 8-inch FPD substrate holder, a 6-inch exposure platform with a variety of illumination sources, an etching module with up to nine simultaneous etching or deposition sources, and a pass-through asset that facilitates vertical transport for substrates. The exposure platform has a 45 x 25 square inch imaging field that provides the ability to pattern devices with line widths down to 0.2 microns. For pre- and post-patterning purposes, the CTL model also includes an advanced platform equipped with a soft-lithography capability, vacuum surface treatment, and plasma etch functions. The CTL equipment is equipped with automated material handling systems and high-speed processing capabilities. The automation on the CTL system is designed to significantly reduce waiting time and user-associated process steps, allowing users to rapidly prototype and process a variety of materials quickly and efficiently. With the CTL unit, users can easily perform accurate photomask design and production processes as well as exact deposition endpoints, consistent resist profile control, and improved resist overlay alignment accuracy. The CTL machine also supports global dielectric etch selectivity and precise etch profiles, enabling users to achieve device patterns on several substrates and technologies with minimum time and cost. The CTL tool is highly reliable and requires minimal maintenance, enabling users to achieve consistent, predictable process results throughout the life of the asset. The model is compact and cost-effective, and is designed to be integrated with other processing tools for a fully automated production process. With its high-performance capabilities and automation, TEL CTL is the ideal solution for industrial and research photoresist processing needs.