Used TEL / TOKYO ELECTRON Clean Track Lithius #9243664 for sale

TEL / TOKYO ELECTRON Clean Track Lithius is an advanced photoresist equipment designed to promote the fab efficiency of the semiconductor production process. It offers a uniquely powerful set of tools to assist in the lithography of each step of the photoresist cycle, allowing the customizing of each process. This system streamlines the fabricating process, creating a reduced cycle time without compromising quality to lead to higher-yield results. TEL Clean Track Lithius unit allows for precise control of the photoresist cycle, enabling seamless lithography processes at each stage. Its Automatic Film Thickness Measurement (FTM) feature ensures that the photoresist film is of the desired thickness throughout the entire photoresist cycle, allowing for a super-precise resist patterning result. This machine also provides a preemptive Cleaning-in-Situ (CIS) feature, which ensures that the photoresist is always in pristine condition prior to imaging. The CIS feature creates a valuable balance between achieving optimal photoresist adhesion and avoiding film adhesion losses. In addition, the tool also includes a top-notch Edge-Tilt Compensation (ETC) feature, which quickly and accurately compensates for the resist pattern displacement which can occur during litho-etching. The automation offered by TOKYO ELECTRON Clean Track Lithius asset also boosts fab throughput by removing the need for manual interventions. The integrated Process Diagnostics Model (PD) is able to detect and eliminate process variations and ensure optimal processing of the resist cassette, allowing for faster, more precise fabrication results. Overall, Clean Track Lithius is an effective and reliable photoresist equipment for semiconductor fabrication. It delivers top-notch lithography results by providing precise control of the film thickness, preemptive cleaning, edge-tilt compensation, and advanced process diagnostics, while at the same time reducing cycle time by removing the need for manual interventions. This system ensures consistent and reliable results throughout the entire photoresist cycle.