Used TEL / TOKYO ELECTRON Clean Track Lithius #9267952 for sale

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TEL / TOKYO ELECTRON Clean Track Lithius
Sold
ID: 9267952
Wafer Size: 12"
Vintage: 2006
(2) Coater / (3) Developer system, 12" Mainframe with controller (4) FOUPS and Carrier station SHINWA T&H-ME-1-1AZAZAZ-01 Temperature and humidity controller SMC INR-244-260A-2 Temperature Controller Unit (TCU) Coater unit (2-1, 2-2): (10) Dispense nozzles With temperature controlled line: HPT 106-2 Pump PR Suck-back valve type: (20) AMC Suck-back valve Degasing system for solvent (PCS Pumps) Programmable side rinse: PR Nozzle: (10) Bottles Solvent 1 supply: CCSS Solvent 2 supply: Local canister tank 1 and 2 Photo resist temperature control system Direct drain type Developer unit: NLD Nozzle Stream nozzle for DI rinse Degasing system for developer (PCS Pumps) Developer supply: CCSS DIW Supply: CCSS Developer temperature control system Direct drain type Chemical cabinets: COAT Cabinet 2-DEV Cabinets AC Power box: 200 / 220 V Full-load current: 152 Amps 2006 vintage.
TEL / TOKYO ELECTRON Clean Track Lithius is a powerful, automated photoresist equipment suitable for a variety of application requirements. The system features high performance, efficient photoresist process control and flexible substrate loading/unloading options. It provides economical and outstanding results in batch-size production. To ensure top performance, the unit provides automated cleaning and drying processes to ensure top results and efficiency. The machine features a robot-controlled cassette loader to accurately load/unload up to 20 wafers at once. The tool also utilizes advanced in-line coating and baking technology, to lower the number of manual process steps required. Additionally, it features sophisticated defect detection and auto-tuning capabilities. The asset utilizes up to six spin coaters, which offer a range of photoresist processing. These options include single layer, double-sided, 20 ±1 um gap filling, residual film thickness measurement, and drycoating control. The spin coater also includes an industry-standard image header, designed to ensure minimum dead volume and minimal formation of surface defects. Furthermore, TEL Clean Track Lithius model is an excellent choice for applications requiring advanced pattern resolution, with outstanding feature control capability and uniform substrate delivery. Its high stability and repeatability allow for efficient batch-size production and further cost savings. The equipment also offers an integrated software solution to manage the production process via a graphical user interface. The integrated software reduces manual intervention to a minimum and includes an internal database, which assists in managing the process flow. Overall, TOKYO ELECTRON Clean Track Lithius is an ideal photoresist system solution for various application requirements. It provides superior process time control, excellent feature control capabilities, and superior defect detection accuracy. Additionally, the integrated software solution streamlines the production process and ensures high yield and repeatability.
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