Used TEL / TOKYO ELECTRON Clean Track Lithius #9267953 for sale
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ID: 9267953
Wafer Size: 12"
Vintage: 2006
(2) Coater / (3) Developer system, 12"
Mainframe with controller
(4) FOUPS and Carrier station
SHINWA T&H-ME-1-1AZAZAZ-01 Temperature and humidity controller
SMC INR-244-260A-2 Temperature Controller Unit (TCU)
Coater unit (2-1, 2-2):
(10) Dispense nozzles
With temperature controlled line: HPT 106-2 Pump
PR Suck-back valve type: (20) AMC Suck-back valve
Degasing system for solvent (PCS Pumps)
Programmable side rinse:
PR Nozzle: (10) Bottles
Solvent 1 supply: CCSS
Solvent 2 supply: Local canister tank 1 and 2
Photo resist temperature control system
Direct drain type
Developer unit:
NLD Nozzle
Stream nozzle for DI rinse
Degasing system for developer (PCS Pumps)
Developer supply: CCSS
DIW Supply: CCSS
Developer temperature control system
Direct drain type
Chemical cabinets:
COAT Cabinet
2-DEV Cabinets
AC Power box: 200 / 220 V
Full-load current: 152 Amps
2006 vintage.
TEL / TOKYO ELECTRON Clean Track Lithius is a state-of-the-art semiconductor wafer processing equipment designed for the production of photoresists. This system combines an advanced cleaning process with a highly accurate photoresist deposition unit to produce the highest quality products on demand. TEL Clean Track Lithius features a pair of robotic arms to move the wafers between cleaning and deposition stages. The machine's integrated cleaning process uses pure water additives and oxygen to provide totally clean wafers that are free of organic and inorganic contaminants. The deposition tool consists of a pair of ultra-high density, plasma-enhanced vapor deposition guns, which thermally vaporize and condense compounds onto the wafer surface, giving excellent uniformity and reproducibility of the photoresist pattern. The asset is configured with two independent conveyor tracks on the top and bottom sides of the process chamber to manage the wafers, and can process up to 300 200mm wafers per hour. The proprietary TOKYO ELECTRON Clean Track Lithius software suite allows for full control of the model parameters during wafer processing, including the ability to save recipes and modify them on the fly. Through its hardware and software, the equipment is capable of achieving deposit uniformity of +/- 0.9µm across the entire wafer surface. The system is equipped with auto-diagnostic capabilities to detect and correct any process abnormalities in real time. In addition to its excellent process control capabilities, Clean Track Lithius also features a variety of safety features to protect the unit from contamination and operation errors. The machine is fitted with multiple metallic anti-contamination baffles and air curtains to minimize leakage of particles into the process chamber. It also uses a multiplexed inlet-pumping architecture to ensure that the gases used in the process are free from hydrocarbons that may be hazardous to the wafer. Finally, the tool is equipped with tool-specific safety circuit checks to ensure that the asset is properly operated. TEL / TOKYO ELECTRON Clean Track Lithius is an ideal tool for precision high-volume photoresist deposition. It is designed for 24/7 operation and is currently installed in a variety of laboratories and production facilities around the world. The model is highly efficient and designed for years of reliable operation, allowing users to process photoresists quickly, increases wafer yields and profitability.
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