Used TEL / TOKYO ELECTRON Clean Track Lithius #9294230 for sale

TEL / TOKYO ELECTRON Clean Track Lithius is a state-of-the-art photoresist equipment designed for advanced lithography production. It offers robust performance and reliability in substrates ranging from 200nm to 40µm. This system features advanced coating technology which ensures uniform coating of resists across the wafer. It also provides excellent handled layer formation and fine resist detail ideal for critical features. The unit's automated machine design delivers precise control of the resist dispense rate and enables fast process ramp-up and stable operation over long run times. A single exposure source affords versatile shapes and four source powers, from high energy to low, ensure higher process yields and improved device performance. TEL Clean Track Lithius is equipped with a variety of tools and options to ensure efficient process integration. The embedded defect inspection tool (EDI) detects surface and embedded defects which are then marked in the resist. This high speed, real-time inspection is designed to guarantee defect-free substrates. It also features leading edge diagnostic capabilities which without disturbances provide detailed information to adapt process conditions that enhance wafer design reliability. The asset also offers an integrated etch station for direct patterning of resist films with its advanced plasma etch technology. Operators may access the integrated etching tool directly from the main control panel making it easy to run both processes on the same wafer cassette. This etching solution feature also offers low contamination levels, easy handling, and fast wafer turn times. TOKYO ELECTRON Clean Track Lithius provides an all-in-one platform for advanced lithography production, enabling increased yield, higher reliability, and faster throughput. With its traditional and innovative features, Clean Track Lithius offers a high-performance solution for critical lithography applications.