Used TEL / TOKYO ELECTRON Clean Track Lithius #9375513 for sale

TEL / TOKYO ELECTRON Clean Track Lithius is a photoresist equipment designed for use in semiconductor and electronics manufacturing. The system utilizes an advanced resist process to deposit and pattern layer of photopolymer photoresist on wafers and other substrate materials. The Lithius unit has a number of features that make it an attractive choice for use in demanding semiconductor processes where precise alignment and uniformity of photoresist deposition are paramount. The frontal exposure chamber of the machine provides for uniform and well-controlled resist exposure along its entire width, providing high quality patterning along the entire wafer. The projection optics used ensures that the resist imaging is consistent from center to edge of the wafer, with uniform movement across the surface and no missed or misaligned patterns. In addition to its superior performing optics, the other primary element of the Lithius tool is its advanced resist processing. Features such as auto-focus control and three-point alignment are present to ensure all contact points are clean and in position for accurate deposition and patterning. The three-point alignment technology used also ensures that the correct amount of resist is applied, and the coating is both consistent and uniform. Moreover, TEL Clean Track Lithius comes with a suite of integrated safety features and options. This includes active and passive ESD protection, static neutralization features, and atmospheric monitoring equipment. These features help ensure the safety of users and components throughout the process. All these features work in tandem to provide users of TOKYO ELECTRON Clean Track Lithius asset with highly accurate and consistent results with minimum effort. Its superior performance and safety features make it a preferred model for demanding and high-precision photoresist processes in the semiconductor industry.