Used TEL / TOKYO ELECTRON Clean Track Lithius #9375518 for sale

TEL / TOKYO ELECTRON Clean Track Lithius is a photoresist equipment designed for advanced semiconductor lithography processes. It is the industry's first "NO HOOD" system, maximizing cleanroom space without compromising performance. This unit uses a proprietary vacuum chuck technology to provide superior non-contacting vacuum wafer holding and improved alignment accuracy. TEL Clean Track Lithius supports full SAED step and repeat, 3D stitching, and overlay alignment aligners. It also offers improved multi-project wafer handling features for reduced particle count, as well as aligner dead time elimination. Additionally, this machine reduces loading and unloading cycle time significantly. TOKYO ELECTRON Clean Track Lithius supports various photoresists for lithography patterning. These include deep sub-micron (DSM) resists with resolutions better than 0.25 microns, as well as high aspect ratio (HAR) resists and thermal compatibility resists (TCR) with sub-micron resolutions. Once a resist is chosen, Clean Track Lithius prepares a unique integration plan for the process. This plan works together with a proprietary photoresist formulation database to create optimal job recipes for each layer. It also works in correlation with an in-situ plasma post bake, and a direct handle wafer delivery for maximum wafer-to-wafer repeatability. Finally, it utilizes integrated sorter capabilities for improved pattern matching. TEL / TOKYO ELECTRON Clean Track Lithius can manage both batch and continuous processes. It can also integrate multiple layers into a single job for improved image continuity. Finally, this tool offers built-in process monitoring and wafer quality control, ensuring consistent, repeatable results. TEL Clean Track Lithius is a reliable, easy-to-use solution for advanced semiconductor lithography processes. Its proprietary vacuum chuck technology, built-in process monitoring features, and comprehensive integration plan make it the ideal choice for precision patterning needs.