Used TEL / TOKYO ELECTRON Clean Track Lithius #9404400 for sale

TEL / TOKYO ELECTRON Clean Track Lithius is a broad-spectrum photoresist equipment designed for advanced lithographic processes in a wide range of imaging and device fabrication applications. It incorporates an advanced microscopic imaging system to ensure clear, clean replicas of mask images with high-resolution accuracy. The unit uses a single-wavelength KrF excimer laser source with a combination of incoherent imaging optics to achieve high-resolution images across a range of depths and sizes. The photoresist is a dual layer of isotropic and anisotropic immobilizing components. The isotropic element ensures excellent wetting, while the anisotropic ensures that immersion projections maintain a good resolution during the process. TEL Clean Track Lithius uses an innovative pattern design process to reduce pattern offset errors. The machine includes options for fast and full-field scanning, vertical- and horizontal-break scanning, and multiple-slice or integrated-field scanning. TOKYO ELECTRON Clean Track Lithius tool also offers a self-adaptive compensation capability for reducing distortions caused by nonlinearities in the imaging process. The application process of the asset begins with photomasking, a process that involves creating a mask image for each pattern. This image is then transferred to the photoresist layer and is set on a substrate. Light is used to reduce the area exposed to light and create the pattern on the mask. After exposing the photoresist layer, a layer of enhancing fluid will be applied to enhance the adhesion of the photoresist to the substrate material. Finally, a hardening process involving intense levels of ultraviolet UV light is used to complete the structure. Overall, Clean Track Lithius provides a wide range of features that enable highly precise, reliable lithography and device fabrication. The advanced imaging model, pattern design process, and self-adaptive compensation capability all help provide precise and clean results with high-resolution accuracy. This equipment is a great choice for anyone looking for a comprehensive, high-quality photoresist system.