Used TEL / TOKYO ELECTRON Clean Track Mark 7 / Mark 8 #9158032 for sale

TEL / TOKYO ELECTRON Clean Track Mark 7 / Mark 8
ID: 9158032
Wafer Size: 4"-12"
Coater / Developer system, 4"-12" Either silicon wafer substrate or LED sapphire substrate Windows GUI scheduler software with Up to date indutrial PC controller High speed SATA SSD storage system with RAID feature Wafer level recipe processing and command Real time process log Online communication (SECS/GEM) Group monitoring Either uni-cassette (open cassette) or SMIF (3 SUCs or 4 SUCs) Integrated CSB Wafer flow modification (Left to right or Right to left) Step / Scanner interface modification (ASML, Nikon, Canon, SVGL) Integrated photo resist dispense monitoring system Integrated chemical dispense monitoring system.
TEL / TOKYO ELECTRON Clean Track Mark 7 / Mark 8 is a photoresist equipment that boasts an advanced stepper technology for creating semiconductor devices. It is a fully automated, precision lithography system that is capable of transferring exceptionally detailed patterns onto a silicon wafer. The Mark 7 / 8 photoresist unit offers features such as a large format scanner and uniform frequency scanning, enabling uniform imaging, long wavelength exposure, and fast and superior overlay. The Mark 7 / 8 features a high accuracy, high speed, and highly reliable clean track stage. It is equipped with a precision stage driven by a direct drive servo motor, enabling uniform imaging exposure across all of the wafer's surfaces. The machine has an integrated linear encoder that provides accurate real-time positional feedback, eliminating the need for external laser interferometers or encoders. Additionally, the advanced tracking controller facilitates low background noise levels and high-speed travel. The Mark 7 / 8 also features an optical tool comprised of high-resolution lenses and motors with precision positioning control for precisely controlling the footprint of the exposure beam. This capability gives the photoresist asset the ability to produce extremely high resolution imaging with superior depth of focus and consistent patterning. In addition, the optics subsystem reduces the amount of stray light and glare that can limit the performance of competing photoresist systems. The Mark 7 / 8 is also engineered to maximize space-efficiency, allowing for maximum utilization of existing or new workshop space. To facilitate this requirement, the photoresist model features a streamlined, robust, and compact layout with a small footprint, that is optimized to fit into appropriate workshops. Overall, TEL Clean Track Mark 7 / Mark 8 is a reliable photoresist equipment designed to produce superior imaging at the highest speed and accuracy, without sacrificing workspace efficiency. With its high-performance optics and tracking servo motors, the system is ideal for creating advanced semiconductor devices in challenging working environments.
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