Used TEL / TOKYO ELECTRON Clean Track Mark 8 #190708 for sale

TEL / TOKYO ELECTRON Clean Track Mark 8 is a photoresist equipment designed for advanced substrate preparation for semiconductor device manufacturing. It is designed for optimized performance, accuracy, and a higher level of repeatability, offering an ideal solution for a range of device fabrication applications. The system is equipped with real-time motion control, precision robotic handling and advanced camera-based vision solutions, allowing for precise substrate movement and accurate positioning. It can be configured with up to three wafers at a time and offers advanced automated optics capabilities, allowing for precise alignment of masks and substrates. TEL Clean Track Mark 8 features a user-friendly graphical interface and is capable of sustained thick film uniformity, offering high-accuracy patterning. Its advanced substrate preparation unit utilizes a combination of cleaning and stripping processes, such as chemical etching and laser stripping, to quickly prepare substrate surfaces for a range of processes. In addition, the advanced optical displacement and displacement speed control provide further accuracy, enabling reliable and accurate patterning. The advanced wafer and mask processing features of TOKYO ELECTRON Clean Track Mark 8 enable accurate and repeatable multi-mask overlay and patterning with high film thickness control. This includes a dedicated mask-lifting mechanism, which is integrated into the vision machine to ascertain accurate wafer-to-mask alignment. Clean Track Mark 8 also provides robust monitoring capability, and the tool is equipped with an advanced recipe management asset and digital process control to ensure efficient recipes are available across all devices. This includes advanced remote monitoring capabilities, including the ability to access process data in real-time. TEL / TOKYO ELECTRON Clean Track Mark 8 is an ideal tool for any process development application requiring high accuracy, reliability, and repeatability. Its robust design and advanced features ensure that it is optimized for long-term performance, making the model an ideal solution for advanced process applications.