Used TEL / TOKYO ELECTRON Clean Track Mark 8 #293585704 for sale

TEL / TOKYO ELECTRON Clean Track Mark 8
ID: 293585704
Wafer Size: 8"
Vintage: 1996
Coater / (2) Developer system, 8" Wafer type: SMIF 1996 vintage.
TEL / TOKYO ELECTRON Clean Track Mark 8 is a sophisticated photoresist equipment designed to precisely align and pattern wafers. It provides a platform designed to take full advantage of TEL Limited's (TOKYO ELECTRON) proven technologies in photolithography, resist processing, and wafer handling. TEL Clean Track Mark 8 is ideal for lithography in photoresist applications. It enables precise positioning of masks, outstanding alignment accuracy and effective pattern transfer to the wafer. The system includes a self-pocketing mini-scope for CCD registration; an ultra-compact alignment stage; a full-field exposure unit; a wafer load station; and integrated wafer handling. These components create a lithography solution that is engineered for enhanced resolution, repeatability, and minimal distortion. The mini-scope features automatic, non-destructive registration of masks and wafers, which reduces exposure time and improves the precision of the alignment. The advanced design of the OptiScope increases throughput and accuracy of alignment and registration by using only one scan, reducing the exposure time, and increasing alignment accuracy when required. The OptiScope also includes real-time displays of the alignment and mask registration information, allowing operations personnel to adjust their products quickly and easily. The Ultra Compact Alignment Stage ensures exquisite accuracy and homogenous alignment by utilizing advanced motorization and mechanical design technologies. It provides stability, precision, and speed and features an embedded, single-piece opto-processing illumination machine. The resulting performance guarantees excellent pattern accuracy after exposure. The Full-Field Exposure Tool offers excellent pattern transfer accuracy and throughput. It uses advanced laser-patterning methods and an electronic shutter, which offers an improved resolution of 5um and a capacity of up to 5 wafers per hour. And the Wafer Load Station allows easy loading and unloading, reducing exposure time and enhancing throughput. The integrated wafer handling asset is designed to provide the hot-swapping and integrated access necessary for a high-performance production environment. The wafer load station is able to connect up to four wafer-introduction systems in parallel, enabling efficient wafer loading and unloading. In summary, TOKYO ELECTRON Clean Track Mark 8 photoresist model offers a comprehensive and reliable platform for efficient production. It provides advanced alignment and exposure management, ensuring precise pattern transfer of wafers. This makes it an ideal solution for the production of high-precision photoresist applications.
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