Used TEL / TOKYO ELECTRON Clean Track Mark 8 #9128613 for sale

TEL / TOKYO ELECTRON Clean Track Mark 8 is a photoresist equipment designed to provide reliable, low-cost plasma etching solutions by virtue of its advanced computer-controlled functionality. Using advanced features such as optimized dry etching profiles, TEL Clean Track Mark 8 ensures superior results with less material consumption and improved etch uniformity. TOKYO ELECTRON Clean Track Mark 8 is equipped with a powerful imaging system and a high-speed scanning stage, enabling users to control and visualize etching processes on the lower micron level. Clean Track Mark 8 can be used to process a variety of materials and substrates, such as silicon, indium phosphide, and gallium arsenide. It supports four types of processes, including photo-resist dissolution and resist refinishing. Additionally, it uses magnetic-type field coils which help to produce secure photoresist adhesion, excellent feature definition, and improved etch uniformity. The unit also offers advanced temperature control, allowing for precise temperature control at each stage of the etching process. In addition to its advanced features, TEL / TOKYO ELECTRON Clean Track Mark 8's aggressive price point and user-friendly interface make it an attractive offering for production facilities of all sizes. In operation, the platform provides an intuitive graphical display that guides the user through each stage of etching, while providing real-time data tracking. Additionally, TEL Clean Track Mark 8 comes with advanced safety features, such as ESD prevention, over-pressure protection, and temperature control to ensure personnel safety. All in all, TOKYO ELECTRON Clean Track Mark 8 is an innovative photoresist machine that offers reliable and cost-effective etching solutions, while providing superior results and enhanced safety features. Through its optimized dry etching profiles and user-friendly operation, Clean Track Mark 8 perfects the etching process with little material consumption and improved uniformity, making it an ideal choice for production facilities across the board.