Used TEL / TOKYO ELECTRON Clean Track Mark 8 #9128615 for sale

TEL / TOKYO ELECTRON Clean Track Mark 8 is a photoresist equipment designed for semiconductor processing at the nanometer scale. This system utilizes advanced dry etching and photoresist co-processing technology to deliver components with superior surface smoothness, higher yield and lower particle counts. The unit is capable of patterning and etching with minimal cleaning steps, allowing fast, uniform and reliable patterning with minimized dielectric damage, while controlling the etch parameters with high precision. TEL Clean Track Mark 8 can accommodate several photoresist recipes, including dual-layer and single-layer patterning. It can process both positive and negative photoresists using VUV/FUV photomask alignment. The machine is designed for unsurpassed performance and uniformity, providing high productive throughputs on a variety of substrates and thin films. The tool is based on the Spin Etch technology, which uses a rotating electrode to etch the wafer in a tracking manner. The rotating electrode produces a uniform etch rate over a wide area and is capable of generating and controlling a uniform, low-pressure plasma over a wide range of power levels. This technology increases uniformity and reduces charge damage due to the thermal treatment of the wafer. TOKYO ELECTRON Clean Track Mark 8 supports high productivity and efficient processing as well as improved etch rate for critical structures. It utilizes an in-line etch-through module to reduce etch time, enable more precise dimensions and faster processing times. In addition, the asset provides precise temperature control and precise etching time control. It also has a variable-angle loading stage to further reduce the time involved in loading and unloading substrates. The systems provides improved overlay accuracy and increased efficiency in photoresist removal. This is achieved by applying and removing photoresists over different angles, allowing the generation of segregated patterns of different sizes and shapes. The model has an in-situ scrubbing capability that can help remove residual particles and particles that adhered to the surface during the etching process. In summary, Clean Track Mark 8 is a photoresist equipment designed for use in semiconductor processing. The system is capable of patterning and etching components at nanometer scale with minimal cleaning steps, and utilizes a variety of advanced technologies including Spin Etch, in-line etch-through module, precise temperature control and precise time control for improved yield and lower particle counts. The unit also provides improved overlay accuracy and increased efficiency in photoresist removal.