Used TEL / TOKYO ELECTRON Clean Track Mark 8 #9128616 for sale

TEL / TOKYO ELECTRON Clean Track Mark 8
ID: 9128616
Wafer Size: 8"
Vintage: 1995
Developer, 8", 1995 vintage.
TEL / TOKYO ELECTRON Clean Track Mark 8 is a photoresist processing equipment, used to process wafers during semiconductor production. The photoresist is a light sensitive epoxy-type material that is selectively hardened when exposed to light, making it ideal for photolithography. With this system, the photoresist is exposed, developed, and stripped in a controlled environment using an automated control unit. TEL Clean Track Mark 8 is a modular platform with a selection of chambers that can be fitted as needed. This allows for numerous types of processes to be performed, such as resist coating, pre-bake, exposure, post-exposure bake, development, stripping, dry-strip and more. The machine is also capable of high-precision localized etching, as the exposure tool uses a laser beam with step-and-repeat alignment. The tool maintains ultra high process yields and is designed for minimal consumption of consumables such as chemicals and wafer-cleaning supplies. Its automatic monitor asset maintains optimal process conditions, with real-time analysis of process data for troubleshooting and repairs. It minimizes downtime with advanced preventative maintenance and offers a range of abilities to recover from process defects or abrasion-related problems. TOKYO ELECTRON Clean Track Mark 8 also boasts an array of features to ensure particle-free production. Its wafer heating model and circulator are designed to prevent condensation in the chamber and an automatic filter rotation equipment prevents filter clogging. With a series of scrubbing brushes and radiant heaters inside the chamber, the system contains particles during the stripping process. Clean Track Mark 8 is an efficient and reliable photoresist unit. Its modular design enables users to customize the solution for their specific process needs, and its high-precision laser alignments help ensure the highest quality yield. Its advanced preventative maintenance and array of particle retention features make it a valuable machine for semiconductor production.
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