Used TEL / TOKYO ELECTRON Clean Track Mark 8 #9158015 for sale
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ID: 9158015
Wafer Size: 8"
Vintage: 1997
(2) Coater / (3) Developer system, 8"
Dual block
Silicon substrate wafer
Wafer flow: Right to left
CSB Unit at right
Interface station unit at left
(2) Process blocks:
Cassette station block (CSB):
FC-9801F Controller
Stage / Indexer:
Non SMIF / Open uni-cassette
Cassette station (CS)
Cassette station arm (CSA)
PSB / Process station block (Spin units):
2-1 Standard photo resist coat unit:
(3) Photo resist dispense nozzles
(3) IWAKI Bellows pumps
Solvent pre-wet reduced resist coat (RRC) nozzle
Side rinse nozzle (Programmable side rinse EBR)
Dual back rinse nozzles
Photo resist temperature control
Motor flange temperature control
Photo resist drain type: Direct gravity drain type
(6) Photo resist bottles in external chemical supply systems
Photo resist auto exchange
Auto dummy dispense system
2-2 Bottom layer coat (BCT) unit:
(3) Bottom layer coat (BCT) dispense nozzles
(3) IWAKI Bellows photo resist pumps
Solvent pre-wet reduced resist coat (RRC) nozzle
Side rinse nozzle (Programmable side rinse EBR)
Dual back rinse nozzle
Photo resist temperature control
Motor flange temperature control
Photo resist drain type: Direct gravity drain type
Photo resist bottle: (6) External photo resist supply system
Photo resist auto exchange
Auto dummy dispense system
Process block robotics arm (PRA)
Adhesion unit (AD)
(5) Hot plate oven units
(2) Dehydration hot plate (DHP) oven units
(2) Cool plate units
Process station block (Spin units):
3-2, 3-3, 3-4 Develop units:
(4) Stream nozzles at (4) Stream nozzle blocks
Rinse nozzles:
(2) Stream type
Spray type
Dual back rinse nozzles
Develop temperature control
Motor flange temperature control
Drain type: Direct gravity drain type
Auto damper
Auto dummy dispense system
Process block robotics (PRA) Arm
Adhesion unit
(3) Hot plate oven units
Dehydration hot plate (DHP) oven unit
(3) Air-purge hot plate (AHP) oven units
(3) Cool plate units
Extension unit
Wafer edge exposure (WEE) unit
Interface station block (IFB):
Interface arm (IFA)
Interface for ASML PAS Series Stepper
(2) Buffers
Pick-up system
Interface cool
Extension stage
Wafer stage
Temperature and humidity controller:
TEAM KOREA TK-TH8T4
2-Cup control capacity for 2 Coat units
External chemical supply system:
Solvent supply system:
Solvent chemical type
CSS Bulk-fill to auto supply system
With (2) Buffer tanks: Auto switch-off / Exchange
Develop supply system:
Develop solution chemical type
CSS Bulk-fill to auto supply system
With (2) Buffer tanks: Auto switch-off / Exchange
Photo resist supply system for 2-1 Coat and 2-2 BCT
6-Bottles of manual supply type
Auto exchange system
HMDS Supply system:
HMDS Chemical type
CSS Bulk-fill to auto supply system with bubbling jar
HMDS Supply system
Themo controller:
External chemical supply system: (2) TEL / TOKYO ELECTRON SMC Multi controller
MAX 16 Channel capacity: 12-Channels for (2) Process
SMC Multi thermo controllers:
(6) SMC Circulators: Chilling channels
2-1 COT Unit
2-2 BCT Unit
Stream nozzle block:
Block 1 and 3: 3-2, 3-3 DEV
Block 2 and 4: 3-4 DEV
(5) Motor flanges
(6) SMC Thermo controllers: Chilling channels
2-9 COL
2-10 COL
3-7 COL
3-11 COL
3-15 COL
4-4 I/F COL
(4) Robots:
CS Arm
(2) Main arm robots
Interface arm
Power transformer AC cabinet: 208 VAC, 3-Phase, 50/60 Hz
1997 vintage.
TEL (TOKYO ELECTRON) TEL / TOKYO ELECTRON Clean Track Mark 8 is a photoresist equipment used in the fabrication of circuit boards. The system is capable of a variety of photoresist processes including spin-coating, soft-baking, mask aligning, spray-coating, and hard-baking. The clean track enables repeatable and accurate results that help create high yields. TEL Clean Track Mark 8 is designed to help reduce cleanroom downtime and improve productivity. It features a durable and reliable antistatic chassis and a "no-ccd" aligning unit that cuts alignment time in half. Furthermore, the machine is equipped with a touch panel LCD display, which makes navigating the tool's functions easier. The asset includes two unique and advanced baking technologies for improved cleanliness and process accuracy. The first is the split bake, which separates the baking process into two parts to decrease the risk of contaminations and optimize the temperature stability. The second is the hybrid bake, which can completely bake the wafer without separating the substrate into tasks. TOKYO ELECTRON Clean Track Mark 8 utilizes specially designed nozzles and cleaners that can rapidly remove resist residue, which results in cleaner wafers while significantly reducing chemical waste production. Special coating capabilities reduce chemical usage and cleaning time by as much as 70%, ceramic head nozzles help reduce total particle counts, and high-precision contact-less tracking helps improve the alignment accuracy. Furthermore, the model is retrofittable, which allows for compatibility with a variety of photoresist systems. Overall, Clean Track Mark 8 uses advanced technologies to enable users to get repeatable and top-notch results while minimizing the use of chemicals, energy, and downtime. It is designed to be an efficient and effective photoresist equipment that helps users attain maximum yields while keeping a cost-effective production.
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