Used TEL / TOKYO ELECTRON Clean Track Mark 8 #9165442 for sale
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ID: 9165442
Wafer Size: 8"
Vintage: 1997
(2) Coater / (2) Developer system, 8"
Single block
Open cassette
Interface for NIKON NSR 2205 EX14C
Silicon substrate wafer
Wafer flow: Left to right
CSB Unit at right
Interface station unit at left
(2) Process blocks: Single block system
Cassette station block (CSB):
FC-9821KE Controller
Stage / Indexer:
Non SMIF / Open uni-cassette
Cassette station (CS)
Cassette station arm (CSA)
Process station block (Spin units):
2-1 Standard photo resist coat unit:
(3) Photo resist dispense nozzles
(3) IWAKI Bellows pumps
Solvent pre-wet reduced resist coat (RRC) nozzle
Side rinse nozzle (Programmable side rinse EBR)
Dual back rinse nozzles
Photo resist temperature control
Motor flange temperature control
Photo resist drain type: Direct gravity drain type
Auto dummy dispense system installed
Photo resist bottle: (6) External chemical supply system
2-2 Anti-reflection coat unit:
(3) Photo resist dispense nozzles
(3) IWAKI Bellows photo resist pumps
Solvent pre-wet reduced resist coat (RRC) nozzle
Side rinse nozzle (Programmable side rinse EBR)
Dual back rinse nozzles
Photo resist temperature control
Motor flange temperature control
Photo resist drain type: Direct gravity drain type
Auto dummy dispense system installed
Photo resist bottle: (6) External chemical supply system
2-3 and 2-4 Develop units:
(4) Stream nozzle blocks
(4) Stream nozzles
(2) Rinse nozzles: Stream type
Dual back rinse nozzles
Develop temperature control
Motor flange temperature control
Drain type: Direct gravity drain type
Auto damper
Auto dummy dispense system
Process block robotics arm (PRA)
Adhesion unit
(10) Hot plate oven units
(2) Air-purge hot plate (AHP) oven units
(7) Cool plate units
Wafer edge exposure (WEE) unit
Interface station block (IFB):
Interface arm (IFA)
(2) Buffers
Pick-up system
Interface cool
Extension stage
Wafer stage
Temperature and humidity controller:
SHINWA T&H-CPC
2-Cup control capacity for (2) Coat units
External chemical supply system:
Solvent supply system for (2-1) COT and (2-2) ARC:
Solvent chemical type
Bulk-fill central chemical supply (CSS) type
With (2) 3-Liter teflon buffer tanks
Develop supply system for 2-3 and 2-4 Develop units:
Develop solution chemical type
Bulk-fill central chemical supply (CSS) type
With (2) 3-Liter teflon buffer tanks
(2) Photo resist supply systems:
6-Bottles of manual supply type
Auto switch-off / Exchange installed
HMDS Supply system:
HMDS Chemical type
Bulk-fill central chemical supply (CSS) type
With 3-Liter teflon buffer tanks for AD unit
External chemical supply system / Cabinet: (2) SMC Multi thermo controller units
SMC Circulator pumps and thermo controller
With 7-Channels:
2-1 COT
2-2 ARC
Motor flanges: 2-1 COT and 2-2 ARC
2-8 COL
2-12 COL
2-16 COL
2-19 COL
SMC Circulator pumps and thermo controller
With 7-Channels:
1 and 3 Stream nozzle blocks: 2-3
2 and 4 Stream nozzle blocks: 2-4
(2) Motor flanges at 2-3 and 2-4 DEV
2-20 COL
2-23 COL
2-24 COL
3-4 I/F COL
(3) Robots:
CS Arm
Main arm robots
Interface arm
Power transformer AC cabinet: 208 VAC, 3-Phase, 50/60 Hz
1997 vintage.
TEL / TOKYO ELECTRON Clean Track Mark 8 is a photoresist system developed to satisfy the requirements of today's ultra-high reliability and high-precision circuit board boards. The Mark 8 utilizes an advanced Ultrasonic Contact Cleansing (UCC) method, equipped with a two-step "Airblow Cleaning and Sweep Cleaning" process. The Airblow Cleaning process uses a high-speed air flow to remove dust, dirt, and contaminates up to a certain size. It utilizes forced air flow to clean the surface without causing any damage or stress to the substrate. The Sweep Cleaning process employs a reciprocating cleaning method using a rotating brush. This removes the small contaminants remaining after the Airblow Cleaning process. The Mark 8 also incorporates several additional features for improved performance and output. These include the use of Specific Density Cleaner (SDC), CCD Camera for Defect Inspection, Temperature Control of Board and Chambers, Hardware and Software Alarm Monitoring, Shimura/Kitta Defect Inspection, Automatic Chemical Level Control, and Roll/Belt type Chip Viscosity Control. The Mark 8 also features an additional level of flexibility with a customizable board base stage, allowing it to process both high and low strain sensor substrates, as well as standardized and non-standardized substrates. Additionally, a height-sensing sensor is integrated into the tool, reducing the chance of particle contamination during processing and increasing performance. In today's era of high-accuracy circuit board boards, TEL Clean Track Mark 8 photoresist system provides the performance and reliability customers' need. It's advanced UCC capabilities combined with several added features help provide customers with consistently clean, high-quality substrates. With the Mark 8's versatility and advanced capabilities, it is designed to meet the most demanding requirements, ensuring unsurpassed performance.
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