Used TEL / TOKYO ELECTRON Clean Track Mark 8 #9227383 for sale

TEL / TOKYO ELECTRON Clean Track Mark 8 is a photoresist equipment that is used for the creation of high-resolution substrates, developed for and used by the semiconductor industry. It is one of the most comprehensive lithography systems available on the market today, enabling users to create wafers and substrates for large-scale production applications. TEL Clean Track Mark 8 system uses advanced photoresist coatings, thin film metal layers, and through-hole processing technologies to produce significantly smaller lines, vias, and contacts. It allows users to produce 3-dimensional features in an extremely high-density, producing precision parts and components to exact standards. The unit is capable of producing 1.5, 2.5 and 10 microns of resolution using 193 nm deep UV light. The machine is capable of patterning wafers up to a 400mm diameter, allowing it to cover even the largest of substrates. The tool also has a built-in edge detector, allowing it to detect the edges of a substrate quickly, accurately, and seamlessly. The asset boasts a high-precision stage and auto-focusing capabilities, allowing for even the most finely detailed substrates to be created. TOKYO ELECTRON Clean Track Mark 8 also allows for multiple layers to be patterned at the same time, allowing for faster production speeds and fewer steps in the creation of complex substrates. The model is also equipped with advanced process control software, enabling users to monitor and adjust parameters throughout the deposition and etching stages of production. This data can then be used to facilitate improvements in yields and production speed. Finally, Clean Track Mark 8 includes automated measurement and alignment systems, allowing for easier monitoring of parameters throughout the production process. These systems also allow for tighter control over the process, allowing for more precise substrates to be created. In conclusion, TEL / TOKYO ELECTRON Clean Track Mark 8 is an advanced photoresist equipment capable of creating even the finest and most complex substrates. Its combination of advanced materials engineering, photonic technology, and process control software allows users to produce highly accurate and reliable substrates in a cost-effective manner.