Used TEL / TOKYO ELECTRON Clean Track Mark 8 #9238274 for sale

TEL / TOKYO ELECTRON Clean Track Mark 8 is a state-of-the-art photoresist equipment designed for high volume manufacturing and inspection of thin film devices. It is capable of precise and accurate handling of chemical based photoresist materials for wafer lithography applications. The Mark 8 features a fully automated spraying and wafer processing system that uses precise measurement and control to generate precise surface coatings and exposed resist on wafers. The Mark 8 is a single-source photoresist unit, which enables it to perform the entire photoresist flow and substrate preparation process. This includes pre-cleaning, wafer processing and deposition of photo-resist materials. Its advanced search and alignment machine is designed to ensure that the photomasks precisely align with the respective patterns on the photoresist layer. Additionally, its optical zone detection systems can recognize subtle errors in the structure of the photoresist films, ensuring the quality and accuracy of the process. The advanced technology of the Mark 8 ensures that it can accurately handle multiple thin film photoresist materials, such as polymeric resist films, polyimide films and photoresist inks. As a result, the tool can perform complex photolithography tasks with ease, such as etching, deposition, molding and litho-etching. Furthermore, the Mark 8 also includes multiple wafer operations and functions, allowing for additional flexibility and versatility. The asset is suitable for a wide range of patterns, from nanometer to micron scales. To ensure precision and repeatability of patterns, the Mark 8 employs advanced thermal manage technology and a very low voltage driving model that avoids the risk of potential electrical damage to the wafer surface. Additionally, the wafer surface can be regulated through the temperature control of the Mark 8's hot plates, further enhancing its accuracy and reliability. Overall, TEL Clean Track Mark 8 is an advanced photoresist equipment designed to precisely and accurately handle thin film photoresist materials for a wide range of lithography applications. Its automated processes and precise wafer handling ensure that accurate and repeatable patterns can be achieved for wafers at the micro and nanometer scale.