Used TEL / TOKYO ELECTRON Clean Track Mark 8 #9250393 for sale

TEL / TOKYO ELECTRON Clean Track Mark 8 is a photoresist equipment for creating photolithographic features for semiconductor devices, used in the fabrication of integrated circuits. The system uses two light sources to pattern photoresist, a focused light source and a scanning source. The focus light source is used to create one layer of the pattern, while the scanning source is used to create successive layers of the photoresist pattern. The focus light source consists of a laser beam that is focused through a series of lenses onto the photoresist layer. This focused beam powers the photoresist, which causes it to cross-link and form a pattern. The pattern is then transferred to the photoresist layer and a number of patterning techniques can be used to achieve different results. The scanning laser source is used to pattern the photoresist. The laser beam is focused on the photoresist and fired in a raster pattern across the photoresist layer. This firing pattern is then repeated for each layer, resulting in a pattern of varying complexity. The laser beam is also used to etch away the excess photoresist, leaving the desired pattern on the substrate. TEL Clean Track Mark 8 unit is capable of producing patterns down to 0.13 micrometers in size, making it capable of producing fine patterns that cannot be achieved by any other photoresist machine. The tool is also less prone to misfires and errors than other photoresist systems, making it a reliable choice for creating semiconductor devices. Additionally, the asset has a shorter processing time than other systems, making it a more efficient choice for manufactures. TOKYO ELECTRON Clean Track Mark 8 is a photoresist model that is highly reliable and efficient, capable of producing patterns down to 0.13 micrometers in size. The equipment is used to create photolithographic features for semiconductor devices, used in the fabrication of integrated circuits. The system uses two light sources - a focus light source and a scanning source - to pattern the photoresist, allowing a high level of precision and accuracy. The unit is less prone to misfires and errors than other systems, making it an ideal solution for manufacturers.