Used TEL / TOKYO ELECTRON Clean Track Mark 8 #9250394 for sale

TEL / TOKYO ELECTRON Clean Track Mark 8
ID: 9250394
Wafer Size: 8"
Vintage: 1997
(2) Coater / (2) Developer system, 8" Single block Interface ASML Stepper Wafer flow: Right to left 1997 vintage.
TEL / TOKYO ELECTRON Clean Track Mark 8 Photoresist Equipment is a high-performance, cost-effective tool for semiconductor processes. It is used to apply patterns of photoresist, a liquid that acts as an etch mask during photolithography, to substrates such as wafers, printed circuit boards and other materials. By exposing a photoresist pattern onto the substrate, TEL Clean Track Mark 8 enables the formation of microstructures, such as ICs, transistors, capacitors and optoelectronic devices. TOKYO ELECTRON Clean Track Mark 8 is designed to provide a high level of precision in layout with substrate alignment and exposure. It features a scalable system architecture, consisting of a Photo Exposure Unit, Resist Coating Unit, Underside Plasma Cleaner, Resist Stripper and UPS exposing plate, all connected to a PC. The unit is equipped with an integrated pattern generator and exposure source and an automatic plate load/unload capability for rapid device production. The machine is capable of achieving a line width accuracy of 1.0μm or better and a measurement accuracy of 0.05μm or better. It is equipped with an advanced precision photo-optical alignment tool that can automatically detect, align and setup the substrate on the track platform to a tolerance of 0.05μm. An 8-inch high-current E-beam source is also used, allowing very fine and dense exposure patterns to be created. In addition, the high-end, Clean Track support package offers a suite of pattern correction and design optimization tools that ensures optimal performance of the wafers and substrates. Clean Track Mark 8 is ideal for high-mix/low-volume operations, providing flexibility and cost savings while maintaining high-performance levels. It can also reduce process times, optimize process repeatability and produce advanced lithography with increased accuracy. The asset is completely programmable and compatible with various resist types, making it a great choice for large-scale production of micro-electronic devices.
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