Used TEL / TOKYO ELECTRON Clean Track Mark 8 #9250396 for sale

TEL / TOKYO ELECTRON Clean Track Mark 8
ID: 9250396
Wafer Size: 8"
Vintage: 1996
(2) Coater / (2) Developer system, 8" Upgraded from Mark 7 Single block Interface NIKON Stepper Wafer flow: Left to right 1996 vintage.
TEL / TOKYO ELECTRON Clean Track Mark 8 is a revolutionary photoresist equipment specifically designed for dry etching applications. This system utilizes a novel process to deliver more than twice the accuracy and extreme uniformity of etched features compared to the traditional wet etching processes. TEL Clean Track Mark 8 is comprised of a two-chamber unit that incorporates an atmospheric-pressure process chamber and a dedicated resist removal chamber. A place-and-etch loader is used to automatically place photoresist onto the substrate plate which allows for independent optimization of the etching process prior to the etching process. The process chamber contains a vacuum level of down to 0.1 mbar and is combined with the use of plasma gas source and input gas sources. The plasma gas source is used to nitride the substrate surface prior to etching and the input gas source is used to create the plasma energy that is used to react with the photoresist and etch the substrate. The unique design of the process chamber features patented "direct-drive" which eliminates the need for an external power source for the chamber. This machine is also designed to reduce unwanted particle generation during the etching process, ensuring a clean and uniform etching. TOKYO ELECTRON Clean Track Mark 8 also features an advanced chemical-resistant stainless steel material chamber design. This design eliminates cross-contamination and eliminates long-term corrosion of materials within the chamber. The chamber is uniquely sealed, to prevent any gas or particle leakage, ensuring the performance of the etch process. Additionally, the chamber is temperature regulated, ensuring consistent etch results. The control tool of Clean Track Mark 8 features an advanced graphical user interface (GUI) and easy remote access for maintenance and analysis. This asset allows for the process parameters such as temperature, pressure, current, and gas concentrations to be monitored. Through these controls, process traceability and data logging of etch parameters is possible, allowing for optimization of the etching processes. TEL / TOKYO ELECTRON Clean Track Mark 8 is designed with safety and environment in mind, including the reduction of volatile organic compounds (VOCs) released into the atmosphere. With an economical design, the model requires less energy and reduces operational cost. Overall, TEL Clean Track Mark 8 is a revolutionary photoresist equipment specifically designed for dry etching processes and provides users with accurate, consistent results. The advanced design of the system makes TOKYO ELECTRON Clean Track Mark 8 a reliable, cost-effective choice for those looking to make improvements to their etching processes.
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