Used TEL / TOKYO ELECTRON Clean Track Mark 8 #9250397 for sale

TEL / TOKYO ELECTRON Clean Track Mark 8
ID: 9250397
Wafer Size: 8"
(2) Coater / Developer system, 8" Upgraded from Mark 7 Single block.
TEL / TOKYO ELECTRON Clean Track Mark 8 photoresist equipment is designed to enable smaller, more complex integrated circuit designs. It allows designers to produce detailed miniature images or patterns on semiconductor substrates. TEL Clean Track Mark 8 has FLEXI-DEVELOP(TM) technology, a proprietary development process developed by TEL to ensure optimal contour definition. Using FLEXI-DEVELOP(TM) technology, TOKYO ELECTRON Clean Track Mark 8 exposes an image onto a photoresist layer on a semiconductor substrate by photolithographic techniques. Photolithography is a process where ultraviolet light is used to create a moiré pattern of pictures on the photoresist layer. The light is then passed through a photomask with a pattern to expose the photoresist layer. Once exposed, the resist layer is developed according to the predefined desghn parameters. The resulting image has extremely high resolution and allows objects to be accurately etched onto the substrate. It is also designed to provide superior process control and uniform conformal wet development. This allows for highly reliable production across various process requirements. Clean Track Mark 8 also has extensive process control capabilities. It has an advanced auto runtime manager to control the temperature, resist exposure rate, and after-development cleaning. The system also has a built-in metrology package to continuously monitor the resist features to ensure accuracy. Additionally, the unit has the performance to modify recipes quickly and accurately to accommodate alteration in the processes. TEL / TOKYO ELECTRON Clean Track Mark 8 can be used for a variety of operations within the semiconductor process such as memory chips, logic chips, and CMOS image sensors. It is well-suited for high power, ultra-thin applications and is used in various process technology nodes. It has the capacity to support multiple patterning applications and has variable speed control mechanisms to customize the processes according to individual needs. Overall, TEL Clean Track Mark 8 photoresist machine provides an advanced design solution for semiconductor processing across many industries. It provides reliable and accurate images, process control capability, and recipe flexibility to ensure optimal device performance.
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