Used TEL / TOKYO ELECTRON Clean Track Mark 8 #9314271 for sale

TEL / TOKYO ELECTRON Clean Track Mark 8 is a highly advanced photoresist equipment designed to provide users with a high-precision deposition and lift-off technology. This state-of-the-art system utilizes advanced chemical and photolithographic processes to ensure consistently high-quality results. At its core, TEL Clean Track Mark 8 consists of a process chamber and weight unit, which is used to dispense a chemical solution, commonly known as photoresist, on to a substrate. This photoresist is designed to be sensitive to light and reacts to certain wavelengths, allowing users to selectively and precisely etch patterns onto the substrate. The process chamber contains multiple adjustable components that enable users to select desired deposition and lift-off parameters, such as the chemical concentration, exposure time, baking temperature, and lift-off time. Once the chemical deposition is completed, the photoresist is exposed to laser light of a designated wavelength, allowing it to etch patterns on the substrate. By using the adjustable parameters of the process chamber, users can control the depth of the etch and the coverage area of the pattern. Once the etching process is complete, the photoresist is removed by a lift-off process in order to reveal the desired pattern. This process requires the use of a mobile platform, which is designed to contain two carriages - one positioned over the substrate and the other positioned over the process chamber. During the lift-off, the second carriage engages with the photoresist and lifts it off the substrate, revealing the desired pattern underneath. TOKYO ELECTRON Clean Track Mark 8 offers a high degree of precision and flexibility thanks to its adjustable parameters. This advanced photoresist machine enables users to create detailed patterns with ease, providing them with an efficient means of creating precision structures.