Used TEL / TOKYO ELECTRON Clean Track Mark 8 #9372744 for sale

TEL / TOKYO ELECTRON Clean Track Mark 8 (CTM-8) is an advanced photoresist equipment designed for the production of semiconductor devices. Photoresist is a light-sensitive material used for patterning in a lithography process, which helps to create the intricate designs that form the basis of many electronics products. The CTM-8 system allows for the rapid and precise development of patterns for both mass production and prototype fabrication of semiconductor chips. The CTM-8 unit works by using a photoresist material called Positive Resist SE 1455 to create a negative relief on the substrate. First, the substrate is coated with a thin layer of the resist and then exposed to ultraviolet light through a mask, which forms a patterned image on the substrate. The CTM-8 machine allows for precise and repeatable exposure of the substrate to ultraviolet light to ensure accurate pattern transfer. The tool is equipped with Automatic Process and Data Monitoring (APDM) software, which allows for an improved control over the printing process and pattern repeatability. The photoresist itself is sensitive to both line width and edge placement accuracy, and needs to be heated during development to ensure proper pattern transfer. The CTM-8 asset features a built-in resist heater and shutter model, which automatically heats the resist for consistent etching and optimizes the layer's optical transparency. The CTM-8 equipment also features an advanced vacuum system with a multi-stage corrosion protection unit to improve the accuracy of pattern transfer, prevent dust particles from settling on the substrate, and improve process repeatability. Finally, the CTM-8 machine can be easily calibrated and monitored through a comprehensive user interface. This allows for both experienced and less experienced users to quickly gain control over the parameters of the tool and ensure accurate results for all proposed projects. With its advanced software and hardware features, CTM-8 is an ideal photoresist asset for producing high-quality semiconductor devices quickly and efficiently.