Used TEL / TOKYO ELECTRON Clean Track Mark II #293672270 for sale

TEL / TOKYO ELECTRON Clean Track Mark II Photoresist Equipment is a comprehensive photolithography system designed for use in semiconductor wafer processing operations. The unit features a number of high-performance components that allow for precision wafer patterning applications. At the core of the machine is its versatile and capable illumination tool that allows highly precise exposure of the photoresist layer on the wafer. A Xenon lamp is used as the light source and a complex projection asset allows for full resolution of the fine features on the wafer, as well as repeatable illumination of the wafer. Additional optical components such as a projection cylinder and relay lenses help provide the high degree of accuracy and repeatability necessary for practical semiconductor processing. The Mark II Photoresist model also features a multi-axis stage assembly that is optimized for accurate and repeatable movement of the wafers between the various components of the equipment. The stage is driven by a high-precision DC servomotor that drives the three-axis control. The stage's highly rigid construction and low-profile design allows for a low center of gravity, thus providing superior motion and motion control while keeping the footprint of the system small. In order to ensure that the precise patterns can be created in a uniform manner for all wafers, the Mark II Photoresist unit also includes a sophisticated calibration machine. This calibration tool automatically aligns the asset's optics and ensures that the exposure of the photoresist is uniform and repeatable across the wafer. The Mark II Photoresist model is designed to be easy to operate and maintain, making it an ideal solution for high-volume wafer processing operations. The equipment includes a number of diagnostic tools and built-in safeguards to minimize downtime and ensure the proper operation of the system. In addition, software updates are also available for the unit, allowing users to keep their machine up to date for the latest improvements. Overall, TEL Clean Track Mark II Photoresist Tool is a comprehensive and easy-to-use solution for semiconductor wafer processing applications. Its precision illumination asset, multi-axis stage assembly, and advanced calibration model enable the highest levels of accuracy and repeatability, while its user-friendly design ensures that the equipment is easy to operate and maintain.