Used TEL / TOKYO ELECTRON Clean Track Mark Vz #142532 for sale
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ID: 142532
Wafer Size: 6"
Vintage: 1994
(1) coater / (2) developer system, 6", 1994 vintage.
TEL / TOKYO ELECTRON Clean Track Mark Vz is a high performance photoresist equipment designed to minimize contamination while providing a reliable and quick photoresist preparation. The system features a track-based cleaning process, where samples are loaded and unloaded using a closed-loop, along with a high-performance process chamber that assists in keeping the environment clean and free of contamination. The unit utilizes a unique track-based cleaning architecture which provides unparalleled protection against contamination. This includes an enclosed transport track which prevents the release of particles into the machine's environment, clean room floors and a specially engineered filtration tool to ensure optimized air-flow and cleanliness from the entrance to the Exit side of the track. The chamber is made of a stainless steel plated interior and a cathodic electrolytic coating for optimum cleanliness for the chamber environment. The chamber walls are coated with a special dielectric mirror coating to reflect infrared radiation and ensure precise focus of light. The chamber also features a set of shutters and an air-flow impingement asset to aid with local cleaning and contamination control, as well as multiple safety features to prevent accidents or mishandling. The model also boasts a high-speed track cleaning process with different speeds that can be adjusted to meet the user's specific requirements. This allows for precise control over the cleaning of a variety of samples, large or small. The track cleaning process is further enhanced by the use of an adjustable speed scrubbing roller and air-flow to ensure contamination-free results. The equipment is further enhanced by its user-friendly software, which offers features such as real-time monitoring of photoresist deposition, data logging and analysis, auto-recipe generation, defocus and repeat recipe execution, sample handling, and final report management. The user interface is intuitive, easy to use and does not require extensive training for optimal use. Overall, TEL Clean Track Mark Vz provides a reliable, contamination-free, and high-performance photoresist system ideal for a range of applications. Its track-based cleaning process allows for precise control over the preparation of samples of any size, and its user-friendly interface makes it easy to use even for novice users.
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