Used TEL / TOKYO ELECTRON Clean Track Mark Vz #9185659 for sale
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ID: 9185659
Wafer Size: 6"
Vintage: 1996
Coater / Developer system, 6"
Spin developer: Up to 5,000 RPM speed, up to 20,000 RPM acceleration
Rotation speed range: 100 - 9,900 RPM
Adhesion temperature setting: 30°C - 199.9° C
Low temperature oven setting: 30°C - 199.9° C
Temperature tolerance: 0.1°C - 25° C
High temperature oven setting: 30°C - 350° C
Cooling temperature setting range: 15°C - 35° C
Drain pan included
Power supply: 100/200 V, 50/60 Hz, Single Phase
1996 vintage.
TEL / TOKYO ELECTRON Clean Track Mark Vz is a photoresist equipment, which stores and dispenses chemicals for the development process of semiconductor lithography. It is designed to protect sensitive components during the development process and reduce contamination. TEL Clean Track Mark Vz incorporates several sophisticated features such as chemical delivery system, chemical tracking, mixing and matching a range of chemicals. The unit makes use of a fluid delivery arm with a nozzle for precise, high-speed chemical delivery. The arm is connected to a central tank for storing a variety of chemicals. The machine is capable of keeping precise, accurate track of the diluted and original chemical concentration through a series of sensors. This allows for the tool to adjust the dilution ratio of chemicals in order to achieve the desired solution strength. The cleaning tank is designed to be highly efficient in maintaining a high purity level. The entire cleaning process takes less than a second. The asset also features an advanced chemical maintenance model to ensure proper handling and tracking of the chemicals used during the development process. The modular design makes it easy to operate and maintain. The welded stainless steel mixing chamber is designed to provide a robust equipment without risk of leaks or system failures. TOKYO ELECTRON Clean Track Mark Vz also includes high-precision accuracy control tools to ensure the optimal process conditions throughout the entire lithography development process. This includes a monitoring unit for chemical levels, temperature, and purity. The machine offers a variety of options for cleaning, mixing and controlling the chemical balance. All of the features in Clean Track Mark Vz are designed to minimize process time, increase throughput, and ensure the highest level of quality in the resulting semiconductor lithography development process.
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